Alignment layer optimization for electrically suppressed helix ferroelectric liquid crystals.
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| Title: | Alignment layer optimization for electrically suppressed helix ferroelectric liquid crystals. |
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| Authors: | Chen, Zhao‐Yi1 (AUTHOR), Swaminathan, Vigneshwaran1 (AUTHOR), Mathew, Chris1 (AUTHOR), Vashchenko, Valerii1 (AUTHOR), Srivastava, Abhishek K.1,2 (AUTHOR) eeabhishek@ust.hk |
| Source: | Journal of the Society for Information Display. May2025, Vol. 33 Issue 5, p491-501. 11p. |
| Subjects: | Diffraction patterns, Low voltage systems, Torque |
| Abstract: | The Electrically Suppressed Helix Ferroelectric Liquid Crystal (ESHFLC) is a promising candidate for contemporary display applications because of its fast response at lower voltages and exceptional optical contrast. Despite its advantages, the limited alignment techniques have impeded the widespread adoption of ESHFLC displays. To address this challenge, we have adopted a Polyimide (PI) that has been commercialized in the display industry; achieving an impressive contrast ratio of up to 9,000:1 for 1.23 wt% PI concentration by exploring varied PI concentrations and rubbing torques. Furthermore, the investigation into ESHFLC diffraction patterns enables us to comprehend the balance between anchoring energy and elastic energy, as well as the influence of varying PI concentrations. These findings not only enhance our understanding of the alignment capabilities of this PI but also offer more possibilities for the large‐scale production of ESHFLC utilizing this PI. [ABSTRACT FROM AUTHOR] |
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| Database: | Engineering Source |
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| Abstract: | The Electrically Suppressed Helix Ferroelectric Liquid Crystal (ESHFLC) is a promising candidate for contemporary display applications because of its fast response at lower voltages and exceptional optical contrast. Despite its advantages, the limited alignment techniques have impeded the widespread adoption of ESHFLC displays. To address this challenge, we have adopted a Polyimide (PI) that has been commercialized in the display industry; achieving an impressive contrast ratio of up to 9,000:1 for 1.23 wt% PI concentration by exploring varied PI concentrations and rubbing torques. Furthermore, the investigation into ESHFLC diffraction patterns enables us to comprehend the balance between anchoring energy and elastic energy, as well as the influence of varying PI concentrations. These findings not only enhance our understanding of the alignment capabilities of this PI but also offer more possibilities for the large‐scale production of ESHFLC utilizing this PI. [ABSTRACT FROM AUTHOR] |
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| ISSN: | 10710922 |
| DOI: | 10.1002/jsid.2072 |
