Alignment layer optimization for electrically suppressed helix ferroelectric liquid crystals.

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Title: Alignment layer optimization for electrically suppressed helix ferroelectric liquid crystals.
Authors: Chen, Zhao‐Yi1 (AUTHOR), Swaminathan, Vigneshwaran1 (AUTHOR), Mathew, Chris1 (AUTHOR), Vashchenko, Valerii1 (AUTHOR), Srivastava, Abhishek K.1,2 (AUTHOR) eeabhishek@ust.hk
Source: Journal of the Society for Information Display. May2025, Vol. 33 Issue 5, p491-501. 11p.
Subjects: Diffraction patterns, Low voltage systems, Torque
Abstract: The Electrically Suppressed Helix Ferroelectric Liquid Crystal (ESHFLC) is a promising candidate for contemporary display applications because of its fast response at lower voltages and exceptional optical contrast. Despite its advantages, the limited alignment techniques have impeded the widespread adoption of ESHFLC displays. To address this challenge, we have adopted a Polyimide (PI) that has been commercialized in the display industry; achieving an impressive contrast ratio of up to 9,000:1 for 1.23 wt% PI concentration by exploring varied PI concentrations and rubbing torques. Furthermore, the investigation into ESHFLC diffraction patterns enables us to comprehend the balance between anchoring energy and elastic energy, as well as the influence of varying PI concentrations. These findings not only enhance our understanding of the alignment capabilities of this PI but also offer more possibilities for the large‐scale production of ESHFLC utilizing this PI. [ABSTRACT FROM AUTHOR]
Copyright of Journal of the Society for Information Display is the property of Wiley-Blackwell and its content may not be copied or emailed to multiple sites without the copyright holder's express written permission. Additionally, content may not be used with any artificial intelligence tools or machine learning technologies. However, users may print, download, or email articles for individual use. This abstract may be abridged. No warranty is given about the accuracy of the copy. Users should refer to the original published version of the material for the full abstract. (Copyright applies to all Abstracts.)
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  Data: Alignment layer optimization for electrically suppressed helix ferroelectric liquid crystals.
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  Data: <searchLink fieldCode="AR" term="%22Chen%2C+Zhao‐Yi%22">Chen, Zhao‐Yi</searchLink><relatesTo>1</relatesTo> (AUTHOR)<br /><searchLink fieldCode="AR" term="%22Swaminathan%2C+Vigneshwaran%22">Swaminathan, Vigneshwaran</searchLink><relatesTo>1</relatesTo> (AUTHOR)<br /><searchLink fieldCode="AR" term="%22Mathew%2C+Chris%22">Mathew, Chris</searchLink><relatesTo>1</relatesTo> (AUTHOR)<br /><searchLink fieldCode="AR" term="%22Vashchenko%2C+Valerii%22">Vashchenko, Valerii</searchLink><relatesTo>1</relatesTo> (AUTHOR)<br /><searchLink fieldCode="AR" term="%22Srivastava%2C+Abhishek+K%2E%22">Srivastava, Abhishek K.</searchLink><relatesTo>1,2</relatesTo> (AUTHOR)<i> eeabhishek@ust.hk</i>
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  Data: <searchLink fieldCode="JN" term="%22Journal+of+the+Society+for+Information+Display%22">Journal of the Society for Information Display</searchLink>. May2025, Vol. 33 Issue 5, p491-501. 11p.
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  Data: <searchLink fieldCode="DE" term="%22Diffraction+patterns%22">Diffraction patterns</searchLink><br /><searchLink fieldCode="DE" term="%22Low+voltage+systems%22">Low voltage systems</searchLink><br /><searchLink fieldCode="DE" term="%22Torque%22">Torque</searchLink>
– Name: Abstract
  Label: Abstract
  Group: Ab
  Data: The Electrically Suppressed Helix Ferroelectric Liquid Crystal (ESHFLC) is a promising candidate for contemporary display applications because of its fast response at lower voltages and exceptional optical contrast. Despite its advantages, the limited alignment techniques have impeded the widespread adoption of ESHFLC displays. To address this challenge, we have adopted a Polyimide (PI) that has been commercialized in the display industry; achieving an impressive contrast ratio of up to 9,000:1 for 1.23 wt% PI concentration by exploring varied PI concentrations and rubbing torques. Furthermore, the investigation into ESHFLC diffraction patterns enables us to comprehend the balance between anchoring energy and elastic energy, as well as the influence of varying PI concentrations. These findings not only enhance our understanding of the alignment capabilities of this PI but also offer more possibilities for the large‐scale production of ESHFLC utilizing this PI. [ABSTRACT FROM AUTHOR]
– Name: AbstractSuppliedCopyright
  Label:
  Group: Ab
  Data: <i>Copyright of Journal of the Society for Information Display is the property of Wiley-Blackwell and its content may not be copied or emailed to multiple sites without the copyright holder's express written permission. Additionally, content may not be used with any artificial intelligence tools or machine learning technologies. However, users may print, download, or email articles for individual use. This abstract may be abridged. No warranty is given about the accuracy of the copy. Users should refer to the original published version of the material for the full abstract.</i> (Copyright applies to all Abstracts.)
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      – Type: doi
        Value: 10.1002/jsid.2072
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      – Code: eng
        Text: English
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        PageCount: 11
        StartPage: 491
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      – SubjectFull: Diffraction patterns
        Type: general
      – SubjectFull: Low voltage systems
        Type: general
      – SubjectFull: Torque
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      – TitleFull: Alignment layer optimization for electrically suppressed helix ferroelectric liquid crystals.
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            NameFull: Chen, Zhao‐Yi
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            NameFull: Swaminathan, Vigneshwaran
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            NameFull: Mathew, Chris
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            NameFull: Vashchenko, Valerii
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            NameFull: Srivastava, Abhishek K.
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            – D: 01
              M: 05
              Text: May2025
              Type: published
              Y: 2025
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              Value: 33
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            – TitleFull: Journal of the Society for Information Display
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