Alignment layer optimization for electrically suppressed helix ferroelectric liquid crystals.
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| Title: | Alignment layer optimization for electrically suppressed helix ferroelectric liquid crystals. |
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| Authors: | Chen, Zhao‐Yi1 (AUTHOR), Swaminathan, Vigneshwaran1 (AUTHOR), Mathew, Chris1 (AUTHOR), Vashchenko, Valerii1 (AUTHOR), Srivastava, Abhishek K.1,2 (AUTHOR) eeabhishek@ust.hk |
| Source: | Journal of the Society for Information Display. May2025, Vol. 33 Issue 5, p491-501. 11p. |
| Subjects: | Diffraction patterns, Low voltage systems, Torque |
| Abstract: | The Electrically Suppressed Helix Ferroelectric Liquid Crystal (ESHFLC) is a promising candidate for contemporary display applications because of its fast response at lower voltages and exceptional optical contrast. Despite its advantages, the limited alignment techniques have impeded the widespread adoption of ESHFLC displays. To address this challenge, we have adopted a Polyimide (PI) that has been commercialized in the display industry; achieving an impressive contrast ratio of up to 9,000:1 for 1.23 wt% PI concentration by exploring varied PI concentrations and rubbing torques. Furthermore, the investigation into ESHFLC diffraction patterns enables us to comprehend the balance between anchoring energy and elastic energy, as well as the influence of varying PI concentrations. These findings not only enhance our understanding of the alignment capabilities of this PI but also offer more possibilities for the large‐scale production of ESHFLC utilizing this PI. [ABSTRACT FROM AUTHOR] |
| Copyright of Journal of the Society for Information Display is the property of Wiley-Blackwell and its content may not be copied or emailed to multiple sites without the copyright holder's express written permission. Additionally, content may not be used with any artificial intelligence tools or machine learning technologies. However, users may print, download, or email articles for individual use. This abstract may be abridged. No warranty is given about the accuracy of the copy. Users should refer to the original published version of the material for the full abstract. (Copyright applies to all Abstracts.) | |
| Database: | Engineering Source |
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| Header | DbId: egs DbLabel: Engineering Source An: 186600887 AccessLevel: 6 PubType: Academic Journal PubTypeId: academicJournal PreciseRelevancyScore: 0 |
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| Items | – Name: Title Label: Title Group: Ti Data: Alignment layer optimization for electrically suppressed helix ferroelectric liquid crystals. – Name: Author Label: Authors Group: Au Data: <searchLink fieldCode="AR" term="%22Chen%2C+Zhao‐Yi%22">Chen, Zhao‐Yi</searchLink><relatesTo>1</relatesTo> (AUTHOR)<br /><searchLink fieldCode="AR" term="%22Swaminathan%2C+Vigneshwaran%22">Swaminathan, Vigneshwaran</searchLink><relatesTo>1</relatesTo> (AUTHOR)<br /><searchLink fieldCode="AR" term="%22Mathew%2C+Chris%22">Mathew, Chris</searchLink><relatesTo>1</relatesTo> (AUTHOR)<br /><searchLink fieldCode="AR" term="%22Vashchenko%2C+Valerii%22">Vashchenko, Valerii</searchLink><relatesTo>1</relatesTo> (AUTHOR)<br /><searchLink fieldCode="AR" term="%22Srivastava%2C+Abhishek+K%2E%22">Srivastava, Abhishek K.</searchLink><relatesTo>1,2</relatesTo> (AUTHOR)<i> eeabhishek@ust.hk</i> – Name: TitleSource Label: Source Group: Src Data: <searchLink fieldCode="JN" term="%22Journal+of+the+Society+for+Information+Display%22">Journal of the Society for Information Display</searchLink>. May2025, Vol. 33 Issue 5, p491-501. 11p. – Name: Subject Label: Subjects Group: Su Data: <searchLink fieldCode="DE" term="%22Diffraction+patterns%22">Diffraction patterns</searchLink><br /><searchLink fieldCode="DE" term="%22Low+voltage+systems%22">Low voltage systems</searchLink><br /><searchLink fieldCode="DE" term="%22Torque%22">Torque</searchLink> – Name: Abstract Label: Abstract Group: Ab Data: The Electrically Suppressed Helix Ferroelectric Liquid Crystal (ESHFLC) is a promising candidate for contemporary display applications because of its fast response at lower voltages and exceptional optical contrast. Despite its advantages, the limited alignment techniques have impeded the widespread adoption of ESHFLC displays. To address this challenge, we have adopted a Polyimide (PI) that has been commercialized in the display industry; achieving an impressive contrast ratio of up to 9,000:1 for 1.23 wt% PI concentration by exploring varied PI concentrations and rubbing torques. Furthermore, the investigation into ESHFLC diffraction patterns enables us to comprehend the balance between anchoring energy and elastic energy, as well as the influence of varying PI concentrations. These findings not only enhance our understanding of the alignment capabilities of this PI but also offer more possibilities for the large‐scale production of ESHFLC utilizing this PI. [ABSTRACT FROM AUTHOR] – Name: AbstractSuppliedCopyright Label: Group: Ab Data: <i>Copyright of Journal of the Society for Information Display is the property of Wiley-Blackwell and its content may not be copied or emailed to multiple sites without the copyright holder's express written permission. Additionally, content may not be used with any artificial intelligence tools or machine learning technologies. However, users may print, download, or email articles for individual use. This abstract may be abridged. No warranty is given about the accuracy of the copy. Users should refer to the original published version of the material for the full abstract.</i> (Copyright applies to all Abstracts.) |
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| RecordInfo | BibRecord: BibEntity: Identifiers: – Type: doi Value: 10.1002/jsid.2072 Languages: – Code: eng Text: English PhysicalDescription: Pagination: PageCount: 11 StartPage: 491 Subjects: – SubjectFull: Diffraction patterns Type: general – SubjectFull: Low voltage systems Type: general – SubjectFull: Torque Type: general Titles: – TitleFull: Alignment layer optimization for electrically suppressed helix ferroelectric liquid crystals. Type: main BibRelationships: HasContributorRelationships: – PersonEntity: Name: NameFull: Chen, Zhao‐Yi – PersonEntity: Name: NameFull: Swaminathan, Vigneshwaran – PersonEntity: Name: NameFull: Mathew, Chris – PersonEntity: Name: NameFull: Vashchenko, Valerii – PersonEntity: Name: NameFull: Srivastava, Abhishek K. IsPartOfRelationships: – BibEntity: Dates: – D: 01 M: 05 Text: May2025 Type: published Y: 2025 Identifiers: – Type: issn-print Value: 10710922 Numbering: – Type: volume Value: 33 – Type: issue Value: 5 Titles: – TitleFull: Journal of the Society for Information Display Type: main |
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