The Development of Hexagonal Boron Nitride Crystal Growth Technologies and Their Applications in Neutron Detection.
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| Title: | The Development of Hexagonal Boron Nitride Crystal Growth Technologies and Their Applications in Neutron Detection. |
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| Authors: | Song, Wendong1 (AUTHOR), Liu, Dan2 (AUTHOR), Wang, Fenglong3 (AUTHOR) wangfenglong@chd.edu.cn, Zhang, Lu4 (AUTHOR) zhanglu17@xidian.edu.cn |
| Source: | Nanomaterials (2079-4991). Aug2025, Vol. 15 Issue 16, p1256. 24p. |
| Subjects: | Boron nitride, Neutron counters, Crystal growth, Crystallization, Wide gap semiconductors, Chemical vapor deposition, Thermal stability |
| Abstract: | Hexagonal boron nitride (h-BN), a wide-bandgap semiconductor with excellent thermal stability, high electrical resistivity, and strong neutron absorption capacity, has attracted growing interest in the field of solid-state neutron detection. This review summarizes the progress in h-BN crystal growth technologies, including HPHT, CVD, and flux methods, highlighting their advantages and limitations. Among them, flux growth stands out for its simplicity and scalability in producing high-quality, large-area single crystals. The application potential of h-BN in next-generation neutron detectors is also discussed, along with key challenges such as 10B enrichment, crystal quality, and device integration. [ABSTRACT FROM AUTHOR] |
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| Database: | Engineering Source |
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| Abstract: | Hexagonal boron nitride (h-BN), a wide-bandgap semiconductor with excellent thermal stability, high electrical resistivity, and strong neutron absorption capacity, has attracted growing interest in the field of solid-state neutron detection. This review summarizes the progress in h-BN crystal growth technologies, including HPHT, CVD, and flux methods, highlighting their advantages and limitations. Among them, flux growth stands out for its simplicity and scalability in producing high-quality, large-area single crystals. The application potential of h-BN in next-generation neutron detectors is also discussed, along with key challenges such as 10B enrichment, crystal quality, and device integration. [ABSTRACT FROM AUTHOR] |
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| ISSN: | 20794991 |
| DOI: | 10.3390/nano15161256 |