Interface Rotation in Accumulative Rolling Bonding (ARB) Cu/Nb Nanolaminates Under Constrained and Unconstrained Loading Conditions as Revealed by In Situ Micromechanical Testing.
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| Title: | Interface Rotation in Accumulative Rolling Bonding (ARB) Cu/Nb Nanolaminates Under Constrained and Unconstrained Loading Conditions as Revealed by In Situ Micromechanical Testing. |
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| Authors: | Sahay, Rahul1,2 (AUTHOR), Radchenko, Ihor1,2,3 (AUTHOR), Ananthasubramanian, Pavithra2,3 (AUTHOR), Harito, Christian4 (AUTHOR), Briffod, Fabien5 (AUTHOR), Yasuda, Koki6 (AUTHOR), Shiraiwa, Takayuki6,7 (AUTHOR), Jhon, Mark7,8 (AUTHOR), Speaks, Rachel8,9 (AUTHOR), Speaks, Derrick1,8,9 (AUTHOR), Lee, Kangjae2,9 (AUTHOR), Enoki, Manabu3,6 (AUTHOR), Raghavan, Nagarajan2,4 (AUTHOR), Budiman, Arief Suriadi4,5,8,9 (AUTHOR) suriadi@alumni.stanford.edu |
| Source: | Nanomaterials (2079-4991). Oct2025, Vol. 15 Issue 19, p1528. 21p. |
| Subjects: | Material plasticity, Interface dynamics, Shearing force, Nanostructured materials, Manufacturing processes, Nanoindentation, Strains & stresses (Mechanics) |
| Abstract: | Accumulative rolling bonding (ARB) Cu/Nb nanolaminates have been widely observed to exhibit unique and large numbers of interface-based plasticity mechanisms, and these have been associated with the many extraordinary properties of the material system, especially resistances in extreme engineering environments (mechanical/pressure, thermal, irradiation, etc.) and ability to self-heal defects (microstructural, as well as radiation-induced). Recently, anisotropy in the interface shearing mechanisms in the material system has been observed and much discussed. The Cu/Nb nanolaminates appear to shear on the interface planes to a much larger extent in the transverse direction (TD) than in the rolling direction (RD). Related to that, in this present study we observe interface rotation in Cu/Nb ARB nanolaminates under constrained and unconstrained loading conditions. Although the primary driving force for interface shearing was expected only in the RD, additional shearing in the TD was observed. This is significant as it represents an interface rotation, while there was no external rotational driving force. First, we observed interface rotation in in situ rectangular micropillar compression experiments, where the interface is simply sheared in one particular direction only, i.e., in the RD. This is rather unexpected as, in rectangular micropillar compression, there is no possibility of extra shearing or driving force in the perpendicular direction due to the loading conditions. This motivated us to subsequently perform in situ microbeam bending experiments (microbeam with a pre-made notch) to verify if similar interface rotation could also be observed in other loading modes. In the beam bending mode, the notch area was primarily under tensile stress in the direction of the beam longitudinal axis, with interfacial shear also in the same direction. Hence, we expect interface shearing only in that direction. We then found that interface rotation was also evident and repeatable under certain circumstances, such as under an offset loading. As this behaviour was consistently observed under two distinct loading modes, we propose that it is an intrinsic characteristic of Cu/Nb interfaces (or FCC/BCC interfaces with specific orientation relationships). This interface rotation represents another interface-based or interface-mediated plasticity mechanism at the nanoscale with important potential implications especially for design of metallic thin films with extreme stretchability and other emerging applications. [ABSTRACT FROM AUTHOR] |
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| Database: | Engineering Source |
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| Abstract: | Accumulative rolling bonding (ARB) Cu/Nb nanolaminates have been widely observed to exhibit unique and large numbers of interface-based plasticity mechanisms, and these have been associated with the many extraordinary properties of the material system, especially resistances in extreme engineering environments (mechanical/pressure, thermal, irradiation, etc.) and ability to self-heal defects (microstructural, as well as radiation-induced). Recently, anisotropy in the interface shearing mechanisms in the material system has been observed and much discussed. The Cu/Nb nanolaminates appear to shear on the interface planes to a much larger extent in the transverse direction (TD) than in the rolling direction (RD). Related to that, in this present study we observe interface rotation in Cu/Nb ARB nanolaminates under constrained and unconstrained loading conditions. Although the primary driving force for interface shearing was expected only in the RD, additional shearing in the TD was observed. This is significant as it represents an interface rotation, while there was no external rotational driving force. First, we observed interface rotation in in situ rectangular micropillar compression experiments, where the interface is simply sheared in one particular direction only, i.e., in the RD. This is rather unexpected as, in rectangular micropillar compression, there is no possibility of extra shearing or driving force in the perpendicular direction due to the loading conditions. This motivated us to subsequently perform in situ microbeam bending experiments (microbeam with a pre-made notch) to verify if similar interface rotation could also be observed in other loading modes. In the beam bending mode, the notch area was primarily under tensile stress in the direction of the beam longitudinal axis, with interfacial shear also in the same direction. Hence, we expect interface shearing only in that direction. We then found that interface rotation was also evident and repeatable under certain circumstances, such as under an offset loading. As this behaviour was consistently observed under two distinct loading modes, we propose that it is an intrinsic characteristic of Cu/Nb interfaces (or FCC/BCC interfaces with specific orientation relationships). This interface rotation represents another interface-based or interface-mediated plasticity mechanism at the nanoscale with important potential implications especially for design of metallic thin films with extreme stretchability and other emerging applications. [ABSTRACT FROM AUTHOR] |
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| ISSN: | 20794991 |
| DOI: | 10.3390/nano15191528 |