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Controlled Arrangement of Liquid Crystal Molecules on SiO2 Film Nanopatterns Using UV Nanoimprint Lithography.

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Title: Controlled Arrangement of Liquid Crystal Molecules on SiO2 Film Nanopatterns Using UV Nanoimprint Lithography.
Authors: Choi, Bo‐Kyeong1 (AUTHOR), Lee, Dong Wook2 (AUTHOR) dongwlee@jj.ac.kr, Seo, Dae‐Shik1 (AUTHOR) dsseo@yonsei.ac.kr
Source: Surface & Interface Analysis: SIA. Jan2026, Vol. 58 Issue 1, p9-17. 9p.
Subjects: Liquid crystals, Nanoimprint lithography, Atomic force microscopy, Silica nanoparticles, X-ray photoelectron spectroscopy, Electric properties, Polarization microscopy
Abstract: This study explores the fabrication of SiO2 nanopatterned thin films using UV nanoimprint lithography (UV‐NIL) to enhance electrical properties. Optimization of UV irradiation time was critical, with 7 min identified as the optimal duration, ensuring superior nanopattern replication, minimal defects, and improved residual charge characteristics. X‐ray photoelectron spectroscopy revealed an increase in O1s peak intensity with extended UV exposure, indicating that UV irradiation promotes C–O bond formation, thereby enhancing the material's catalytic activity and electronic properties. Atomic force microscopy provided 2D and 3D imaging, confirming high‐fidelity pattern replication, which was further supported by line profile analysis. Additionally, polarized optical microscopy demonstrated uniform liquid crystal alignment on the film, enabling precise light control. These results underscore the potential of SiO2 alignment films fabricated via UV‐NIL with a 7‐min UV exposure for future display technologies. [ABSTRACT FROM AUTHOR]
Copyright of Surface & Interface Analysis: SIA is the property of Wiley-Blackwell and its content may not be copied or emailed to multiple sites without the copyright holder's express written permission. Additionally, content may not be used with any artificial intelligence tools or machine learning technologies. However, users may print, download, or email articles for individual use. This abstract may be abridged. No warranty is given about the accuracy of the copy. Users should refer to the original published version of the material for the full abstract. (Copyright applies to all Abstracts.)
Database: Engineering Source
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DbLabel: Engineering Source
An: 189711604
AccessLevel: 6
PubType: Academic Journal
PubTypeId: academicJournal
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Items – Name: Title
  Label: Title
  Group: Ti
  Data: Controlled Arrangement of Liquid Crystal Molecules on SiO<subscript>2</subscript> Film Nanopatterns Using UV Nanoimprint Lithography.
– Name: Author
  Label: Authors
  Group: Au
  Data: <searchLink fieldCode="AR" term="%22Choi%2C+Bo‐Kyeong%22">Choi, Bo‐Kyeong</searchLink><relatesTo>1</relatesTo> (AUTHOR)<br /><searchLink fieldCode="AR" term="%22Lee%2C+Dong Wook%22">Lee, Dong Wook</searchLink><relatesTo>2</relatesTo> (AUTHOR)<i> dongwlee@jj.ac.kr</i><br /><searchLink fieldCode="AR" term="%22Seo%2C+Dae‐Shik%22">Seo, Dae‐Shik</searchLink><relatesTo>1</relatesTo> (AUTHOR)<i> dsseo@yonsei.ac.kr</i>
– Name: TitleSource
  Label: Source
  Group: Src
  Data: <searchLink fieldCode="JN" term="%22Surface+%26+Interface+Analysis%3A+SIA%22">Surface & Interface Analysis: SIA</searchLink>. Jan2026, Vol. 58 Issue 1, p9-17. 9p.
– Name: Subject
  Label: Subjects
  Group: Su
  Data: <searchLink fieldCode="DE" term="%22Liquid+crystals%22">Liquid crystals</searchLink><br /><searchLink fieldCode="DE" term="%22Nanoimprint+lithography%22">Nanoimprint lithography</searchLink><br /><searchLink fieldCode="DE" term="%22Atomic+force+microscopy%22">Atomic force microscopy</searchLink><br /><searchLink fieldCode="DE" term="%22Silica+nanoparticles%22">Silica nanoparticles</searchLink><br /><searchLink fieldCode="DE" term="%22X-ray+photoelectron+spectroscopy%22">X-ray photoelectron spectroscopy</searchLink><br /><searchLink fieldCode="DE" term="%22Electric+properties%22">Electric properties</searchLink><br /><searchLink fieldCode="DE" term="%22Polarization+microscopy%22">Polarization microscopy</searchLink>
– Name: Abstract
  Label: Abstract
  Group: Ab
  Data: This study explores the fabrication of SiO2 nanopatterned thin films using UV nanoimprint lithography (UV‐NIL) to enhance electrical properties. Optimization of UV irradiation time was critical, with 7 min identified as the optimal duration, ensuring superior nanopattern replication, minimal defects, and improved residual charge characteristics. X‐ray photoelectron spectroscopy revealed an increase in O1s peak intensity with extended UV exposure, indicating that UV irradiation promotes C–O bond formation, thereby enhancing the material's catalytic activity and electronic properties. Atomic force microscopy provided 2D and 3D imaging, confirming high‐fidelity pattern replication, which was further supported by line profile analysis. Additionally, polarized optical microscopy demonstrated uniform liquid crystal alignment on the film, enabling precise light control. These results underscore the potential of SiO2 alignment films fabricated via UV‐NIL with a 7‐min UV exposure for future display technologies. [ABSTRACT FROM AUTHOR]
– Name: AbstractSuppliedCopyright
  Label:
  Group: Ab
  Data: <i>Copyright of Surface & Interface Analysis: SIA is the property of Wiley-Blackwell and its content may not be copied or emailed to multiple sites without the copyright holder's express written permission. Additionally, content may not be used with any artificial intelligence tools or machine learning technologies. However, users may print, download, or email articles for individual use. This abstract may be abridged. No warranty is given about the accuracy of the copy. Users should refer to the original published version of the material for the full abstract.</i> (Copyright applies to all Abstracts.)
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RecordInfo BibRecord:
  BibEntity:
    Identifiers:
      – Type: doi
        Value: 10.1002/sia.70028
    Languages:
      – Code: eng
        Text: English
    PhysicalDescription:
      Pagination:
        PageCount: 9
        StartPage: 9
    Subjects:
      – SubjectFull: Liquid crystals
        Type: general
      – SubjectFull: Nanoimprint lithography
        Type: general
      – SubjectFull: Atomic force microscopy
        Type: general
      – SubjectFull: Silica nanoparticles
        Type: general
      – SubjectFull: X-ray photoelectron spectroscopy
        Type: general
      – SubjectFull: Electric properties
        Type: general
      – SubjectFull: Polarization microscopy
        Type: general
    Titles:
      – TitleFull: Controlled Arrangement of Liquid Crystal Molecules on SiO2 Film Nanopatterns Using UV Nanoimprint Lithography.
        Type: main
  BibRelationships:
    HasContributorRelationships:
      – PersonEntity:
          Name:
            NameFull: Choi, Bo‐Kyeong
      – PersonEntity:
          Name:
            NameFull: Lee, Dong Wook
      – PersonEntity:
          Name:
            NameFull: Seo, Dae‐Shik
    IsPartOfRelationships:
      – BibEntity:
          Dates:
            – D: 01
              M: 01
              Text: Jan2026
              Type: published
              Y: 2026
          Identifiers:
            – Type: issn-print
              Value: 01422421
          Numbering:
            – Type: volume
              Value: 58
            – Type: issue
              Value: 1
          Titles:
            – TitleFull: Surface & Interface Analysis: SIA
              Type: main
ResultId 1