Modification of Femtosecond Laser Absorption by Electron Beam Irradiation.
Saved in:
| Title: | Modification of Femtosecond Laser Absorption by Electron Beam Irradiation. |
|---|---|
| Authors: | Schneider, Nicolai1,2 nicolai.schneider@lpt.uni-erlangen.de, Chechik, Lova1,2, Schmidt, Michael1,2, Cvecek, Kristian1,2 |
| Source: | Journal of Laser Micro / Nanoengineering. Nov2025, Vol. 20 Issue 3, p198-203. 6p. |
| Subjects: | Femtosecond lasers, Multiphoton ionization, Glass, Multiphoton absorption, Laser damage, Electron beams, Surface morphology, Dielectric materials |
| Abstract: | Dielectric materials interact with ultra-fast lasers through various nonlinear absorption mechanisms, leading to ionization of the material. Specifically, quasi-free electrons are generated in the conduction band via multiphoton ionization (MPI) or tunneling ionization. When the density of these quasi-free electrons exceeds a critical threshold, ablation of the material occurs. In this work, the influence of extrinsically seeded electrons on the laser ablation threshold and the crater morphology on soda-lime glass for femtosecond laser single-shot experiments is investigated. For this, the laser was focused inside a modified scanning electron microscope, where the soda-lime glass samples were installed. Results show that irradiation with extrinsic electrons, provided by the SEM electron gun, can increase the ablation volume and decrease the ablation threshold. [ABSTRACT FROM AUTHOR] |
| Copyright of Journal of Laser Micro / Nanoengineering is the property of Japan Laser Processing Society and its content may not be copied or emailed to multiple sites without the copyright holder's express written permission. Additionally, content may not be used with any artificial intelligence tools or machine learning technologies. However, users may print, download, or email articles for individual use. This abstract may be abridged. No warranty is given about the accuracy of the copy. Users should refer to the original published version of the material for the full abstract. (Copyright applies to all Abstracts.) | |
| Database: | Engineering Source |
| FullText | Links: – Type: pdflink Text: Availability: 0 |
|---|---|
| Header | DbId: egs DbLabel: Engineering Source An: 189923616 AccessLevel: 6 PubType: Academic Journal PubTypeId: academicJournal PreciseRelevancyScore: 0 |
| IllustrationInfo | |
| Items | – Name: Title Label: Title Group: Ti Data: Modification of Femtosecond Laser Absorption by Electron Beam Irradiation. – Name: Author Label: Authors Group: Au Data: <searchLink fieldCode="AR" term="%22Schneider%2C+Nicolai%22">Schneider, Nicolai</searchLink><relatesTo>1,2</relatesTo><i> nicolai.schneider@lpt.uni-erlangen.de</i><br /><searchLink fieldCode="AR" term="%22Chechik%2C+Lova%22">Chechik, Lova</searchLink><relatesTo>1,2</relatesTo><br /><searchLink fieldCode="AR" term="%22Schmidt%2C+Michael%22">Schmidt, Michael</searchLink><relatesTo>1,2</relatesTo><br /><searchLink fieldCode="AR" term="%22Cvecek%2C+Kristian%22">Cvecek, Kristian</searchLink><relatesTo>1,2</relatesTo> – Name: TitleSource Label: Source Group: Src Data: <searchLink fieldCode="JN" term="%22Journal+of+Laser+Micro+%2F+Nanoengineering%22">Journal of Laser Micro / Nanoengineering</searchLink>. Nov2025, Vol. 20 Issue 3, p198-203. 6p. – Name: Subject Label: Subjects Group: Su Data: <searchLink fieldCode="DE" term="%22Femtosecond+lasers%22">Femtosecond lasers</searchLink><br /><searchLink fieldCode="DE" term="%22Multiphoton+ionization%22">Multiphoton ionization</searchLink><br /><searchLink fieldCode="DE" term="%22Glass%22">Glass</searchLink><br /><searchLink fieldCode="DE" term="%22Multiphoton+absorption%22">Multiphoton absorption</searchLink><br /><searchLink fieldCode="DE" term="%22Laser+damage%22">Laser damage</searchLink><br /><searchLink fieldCode="DE" term="%22Electron+beams%22">Electron beams</searchLink><br /><searchLink fieldCode="DE" term="%22Surface+morphology%22">Surface morphology</searchLink><br /><searchLink fieldCode="DE" term="%22Dielectric+materials%22">Dielectric materials</searchLink> – Name: Abstract Label: Abstract Group: Ab Data: Dielectric materials interact with ultra-fast lasers through various nonlinear absorption mechanisms, leading to ionization of the material. Specifically, quasi-free electrons are generated in the conduction band via multiphoton ionization (MPI) or tunneling ionization. When the density of these quasi-free electrons exceeds a critical threshold, ablation of the material occurs. In this work, the influence of extrinsically seeded electrons on the laser ablation threshold and the crater morphology on soda-lime glass for femtosecond laser single-shot experiments is investigated. For this, the laser was focused inside a modified scanning electron microscope, where the soda-lime glass samples were installed. Results show that irradiation with extrinsic electrons, provided by the SEM electron gun, can increase the ablation volume and decrease the ablation threshold. [ABSTRACT FROM AUTHOR] – Name: AbstractSuppliedCopyright Label: Group: Ab Data: <i>Copyright of Journal of Laser Micro / Nanoengineering is the property of Japan Laser Processing Society and its content may not be copied or emailed to multiple sites without the copyright holder's express written permission. Additionally, content may not be used with any artificial intelligence tools or machine learning technologies. However, users may print, download, or email articles for individual use. This abstract may be abridged. No warranty is given about the accuracy of the copy. Users should refer to the original published version of the material for the full abstract.</i> (Copyright applies to all Abstracts.) |
| PLink | https://search.ebscohost.com/login.aspx?direct=true&site=eds-live&db=egs&AN=189923616 |
| RecordInfo | BibRecord: BibEntity: Identifiers: – Type: doi Value: 10.2961/jlmn.2025.03.2004 Languages: – Code: eng Text: English PhysicalDescription: Pagination: PageCount: 6 StartPage: 198 Subjects: – SubjectFull: Femtosecond lasers Type: general – SubjectFull: Multiphoton ionization Type: general – SubjectFull: Glass Type: general – SubjectFull: Multiphoton absorption Type: general – SubjectFull: Laser damage Type: general – SubjectFull: Electron beams Type: general – SubjectFull: Surface morphology Type: general – SubjectFull: Dielectric materials Type: general Titles: – TitleFull: Modification of Femtosecond Laser Absorption by Electron Beam Irradiation. Type: main BibRelationships: HasContributorRelationships: – PersonEntity: Name: NameFull: Schneider, Nicolai – PersonEntity: Name: NameFull: Chechik, Lova – PersonEntity: Name: NameFull: Schmidt, Michael – PersonEntity: Name: NameFull: Cvecek, Kristian IsPartOfRelationships: – BibEntity: Dates: – D: 01 M: 11 Text: Nov2025 Type: published Y: 2025 Identifiers: – Type: issn-print Value: 18800688 Numbering: – Type: volume Value: 20 – Type: issue Value: 3 Titles: – TitleFull: Journal of Laser Micro / Nanoengineering Type: main |
| ResultId | 1 |