Bibliographic Details
| Title: |
Real- Time Lithography Registration, Exposure, and Focus Control -- A Framework for Success. |
| Authors: |
Janakiram, Mani1 mani.janakiram@intel.com, Goernitz, Scot1 scot.goernitz@intel.com |
| Source: |
IEEE Transactions on Semiconductor Manufacturing. Nov2005, Vol. 18 Issue 4, p534-538. 5p. |
| Subjects: |
Semiconductor industry, Intel computers, Quality control, Motion control devices, Metrology, Manufacturing processes |
| Abstract: |
Intel factories are being challenged by an increasingly diverse product and technology mix. Semiconductor manufacturers have successfully leveraged advanced process control (APC) for overlay and critical dimension (CD) in the lithography module. Trends are continuously corrected through in-line metrology feed back, keeping the process on target. Applying an APC system suitable for litho control in high-volume manufacturing has resulted in significant improvement in registration capability and potential for better exposure focus and CD control. [ABSTRACT FROM AUTHOR] |
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| Database: |
Engineering Source |
