Real- Time Lithography Registration, Exposure, and Focus Control -- A Framework for Success.
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| Title: | Real- Time Lithography Registration, Exposure, and Focus Control -- A Framework for Success. |
|---|---|
| Authors: | Janakiram, Mani1 mani.janakiram@intel.com, Goernitz, Scot1 scot.goernitz@intel.com |
| Source: | IEEE Transactions on Semiconductor Manufacturing. Nov2005, Vol. 18 Issue 4, p534-538. 5p. |
| Subjects: | Semiconductor industry, Intel computers, Quality control, Motion control devices, Metrology, Manufacturing processes |
| Abstract: | Intel factories are being challenged by an increasingly diverse product and technology mix. Semiconductor manufacturers have successfully leveraged advanced process control (APC) for overlay and critical dimension (CD) in the lithography module. Trends are continuously corrected through in-line metrology feed back, keeping the process on target. Applying an APC system suitable for litho control in high-volume manufacturing has resulted in significant improvement in registration capability and potential for better exposure focus and CD control. [ABSTRACT FROM AUTHOR] |
| Copyright of IEEE Transactions on Semiconductor Manufacturing is the property of IEEE and its content may not be copied or emailed to multiple sites without the copyright holder's express written permission. Additionally, content may not be used with any artificial intelligence tools or machine learning technologies. However, users may print, download, or email articles for individual use. This abstract may be abridged. No warranty is given about the accuracy of the copy. Users should refer to the original published version of the material for the full abstract. (Copyright applies to all Abstracts.) | |
| Database: | Engineering Source |
| FullText | Text: Availability: 0 |
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| Header | DbId: egs DbLabel: Engineering Source An: 19024580 AccessLevel: 6 PubType: Academic Journal PubTypeId: academicJournal PreciseRelevancyScore: 0 |
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| Items | – Name: Title Label: Title Group: Ti Data: Real- Time Lithography Registration, Exposure, and Focus Control -- A Framework for Success. – Name: Author Label: Authors Group: Au Data: <searchLink fieldCode="AR" term="%22Janakiram%2C+Mani%22">Janakiram, Mani</searchLink><relatesTo>1</relatesTo><i> mani.janakiram@intel.com</i><br /><searchLink fieldCode="AR" term="%22Goernitz%2C+Scot%22">Goernitz, Scot</searchLink><relatesTo>1</relatesTo><i> scot.goernitz@intel.com</i> – Name: TitleSource Label: Source Group: Src Data: <searchLink fieldCode="JN" term="%22IEEE+Transactions+on+Semiconductor+Manufacturing%22">IEEE Transactions on Semiconductor Manufacturing</searchLink>. Nov2005, Vol. 18 Issue 4, p534-538. 5p. – Name: Subject Label: Subjects Group: Su Data: <searchLink fieldCode="DE" term="%22Semiconductor+industry%22">Semiconductor industry</searchLink><br /><searchLink fieldCode="DE" term="%22Intel+computers%22">Intel computers</searchLink><br /><searchLink fieldCode="DE" term="%22Quality+control%22">Quality control</searchLink><br /><searchLink fieldCode="DE" term="%22Motion+control+devices%22">Motion control devices</searchLink><br /><searchLink fieldCode="DE" term="%22Metrology%22">Metrology</searchLink><br /><searchLink fieldCode="DE" term="%22Manufacturing+processes%22">Manufacturing processes</searchLink> – Name: Abstract Label: Abstract Group: Ab Data: Intel factories are being challenged by an increasingly diverse product and technology mix. Semiconductor manufacturers have successfully leveraged advanced process control (APC) for overlay and critical dimension (CD) in the lithography module. Trends are continuously corrected through in-line metrology feed back, keeping the process on target. Applying an APC system suitable for litho control in high-volume manufacturing has resulted in significant improvement in registration capability and potential for better exposure focus and CD control. [ABSTRACT FROM AUTHOR] – Name: AbstractSuppliedCopyright Label: Group: Ab Data: <i>Copyright of IEEE Transactions on Semiconductor Manufacturing is the property of IEEE and its content may not be copied or emailed to multiple sites without the copyright holder's express written permission. Additionally, content may not be used with any artificial intelligence tools or machine learning technologies. However, users may print, download, or email articles for individual use. This abstract may be abridged. No warranty is given about the accuracy of the copy. Users should refer to the original published version of the material for the full abstract.</i> (Copyright applies to all Abstracts.) |
| PLink | https://search.ebscohost.com/login.aspx?direct=true&site=eds-live&db=egs&AN=19024580 |
| RecordInfo | BibRecord: BibEntity: Identifiers: – Type: doi Value: 10.1109/TSM.2005.858496 Languages: – Code: eng Text: English PhysicalDescription: Pagination: PageCount: 5 StartPage: 534 Subjects: – SubjectFull: Semiconductor industry Type: general – SubjectFull: Intel computers Type: general – SubjectFull: Quality control Type: general – SubjectFull: Motion control devices Type: general – SubjectFull: Metrology Type: general – SubjectFull: Manufacturing processes Type: general Titles: – TitleFull: Real- Time Lithography Registration, Exposure, and Focus Control -- A Framework for Success. Type: main BibRelationships: HasContributorRelationships: – PersonEntity: Name: NameFull: Janakiram, Mani – PersonEntity: Name: NameFull: Goernitz, Scot IsPartOfRelationships: – BibEntity: Dates: – D: 01 M: 11 Text: Nov2005 Type: published Y: 2005 Identifiers: – Type: issn-print Value: 08946507 Numbering: – Type: volume Value: 18 – Type: issue Value: 4 Titles: – TitleFull: IEEE Transactions on Semiconductor Manufacturing Type: main |
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