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Continuous superposition of high power pulses and radio frequency power on a single magnetron target.

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Title: Continuous superposition of high power pulses and radio frequency power on a single magnetron target.
Authors: Müller, J.1 (AUTHOR) jonas.mueller@iwm.fraunhofer.de, Swoboda, J.1 (AUTHOR), Burmeister, F.1 (AUTHOR), Fromm, A.1 (AUTHOR), Wirth, M.1 (AUTHOR), Killinger, A.2 (AUTHOR), Ulrich, S.3 (AUTHOR)
Source: Surface & Coatings Technology. Feb2026, Vol. 521, pN.PAG-N.PAG. 1p.
Subjects: Radiofrequency sputtering, Magnetron sputtering, Thin films, Current-voltage characteristics, Sputtering (Physics), Plasma oscillations, Electric arc
Abstract: High Power Impulse Magnetron Sputtering (HiPIMS) offers significant advantages over established sputtering techniques such as DC, MF, or RF sputtering. Thin films deposited with HiPIMS exhibit improved properties but often suffer from low deposition rates. In addition, reactive HiPIMS processes tend to arc. Superposition of different plasma excitations may help to overcome these limitations. We investigated the superposition of HiPIMS and RF on a single magnetron and studied voltage–current characteristics as well as the influence of pressure on process stability and cathode voltage for the reactive and non-reactive deposition of Aluminium in Ar/O2 discharge. We found that superimposing RF onto HiPIMS allows for stable operation at lower pressures and reduces arcing. Notably, the effect of the superimposed RF on peak current differs by mode: in reactive sputtering, the HiPIMS peak current is increased, while in non-reactive mode, the peak current is decreased. This is attributed to the different secondary electron emission in non-reactive and reactive mode. • Combination of HiPIMS and RF Magnetron Sputtering on a single Magnetron Target. • Plasma ignition and stable operation at lower pressures. • Dependence of I-U-curves on sputter mode (metallic vs. reactive). [ABSTRACT FROM AUTHOR]
Copyright of Surface & Coatings Technology is the property of Elsevier B.V. and its content may not be copied or emailed to multiple sites without the copyright holder's express written permission. Additionally, content may not be used with any artificial intelligence tools or machine learning technologies. However, users may print, download, or email articles for individual use. This abstract may be abridged. No warranty is given about the accuracy of the copy. Users should refer to the original published version of the material for the full abstract. (Copyright applies to all Abstracts.)
Database: Engineering Source
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Header DbId: egs
DbLabel: Engineering Source
An: 190825328
AccessLevel: 6
PubType: Academic Journal
PubTypeId: academicJournal
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  Data: Continuous superposition of high power pulses and radio frequency power on a single magnetron target.
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  Data: <searchLink fieldCode="AR" term="%22Müller%2C+J%2E%22">Müller, J.</searchLink><relatesTo>1</relatesTo> (AUTHOR)<i> jonas.mueller@iwm.fraunhofer.de</i><br /><searchLink fieldCode="AR" term="%22Swoboda%2C+J%2E%22">Swoboda, J.</searchLink><relatesTo>1</relatesTo> (AUTHOR)<br /><searchLink fieldCode="AR" term="%22Burmeister%2C+F%2E%22">Burmeister, F.</searchLink><relatesTo>1</relatesTo> (AUTHOR)<br /><searchLink fieldCode="AR" term="%22Fromm%2C+A%2E%22">Fromm, A.</searchLink><relatesTo>1</relatesTo> (AUTHOR)<br /><searchLink fieldCode="AR" term="%22Wirth%2C+M%2E%22">Wirth, M.</searchLink><relatesTo>1</relatesTo> (AUTHOR)<br /><searchLink fieldCode="AR" term="%22Killinger%2C+A%2E%22">Killinger, A.</searchLink><relatesTo>2</relatesTo> (AUTHOR)<br /><searchLink fieldCode="AR" term="%22Ulrich%2C+S%2E%22">Ulrich, S.</searchLink><relatesTo>3</relatesTo> (AUTHOR)
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  Data: <searchLink fieldCode="JN" term="%22Surface+%26+Coatings+Technology%22">Surface & Coatings Technology</searchLink>. Feb2026, Vol. 521, pN.PAG-N.PAG. 1p.
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  Data: <searchLink fieldCode="DE" term="%22Radiofrequency+sputtering%22">Radiofrequency sputtering</searchLink><br /><searchLink fieldCode="DE" term="%22Magnetron+sputtering%22">Magnetron sputtering</searchLink><br /><searchLink fieldCode="DE" term="%22Thin+films%22">Thin films</searchLink><br /><searchLink fieldCode="DE" term="%22Current-voltage+characteristics%22">Current-voltage characteristics</searchLink><br /><searchLink fieldCode="DE" term="%22Sputtering+%28Physics%29%22">Sputtering (Physics)</searchLink><br /><searchLink fieldCode="DE" term="%22Plasma+oscillations%22">Plasma oscillations</searchLink><br /><searchLink fieldCode="DE" term="%22Electric+arc%22">Electric arc</searchLink>
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  Data: High Power Impulse Magnetron Sputtering (HiPIMS) offers significant advantages over established sputtering techniques such as DC, MF, or RF sputtering. Thin films deposited with HiPIMS exhibit improved properties but often suffer from low deposition rates. In addition, reactive HiPIMS processes tend to arc. Superposition of different plasma excitations may help to overcome these limitations. We investigated the superposition of HiPIMS and RF on a single magnetron and studied voltage–current characteristics as well as the influence of pressure on process stability and cathode voltage for the reactive and non-reactive deposition of Aluminium in Ar/O2 discharge. We found that superimposing RF onto HiPIMS allows for stable operation at lower pressures and reduces arcing. Notably, the effect of the superimposed RF on peak current differs by mode: in reactive sputtering, the HiPIMS peak current is increased, while in non-reactive mode, the peak current is decreased. This is attributed to the different secondary electron emission in non-reactive and reactive mode. • Combination of HiPIMS and RF Magnetron Sputtering on a single Magnetron Target. • Plasma ignition and stable operation at lower pressures. • Dependence of I-U-curves on sputter mode (metallic vs. reactive). [ABSTRACT FROM AUTHOR]
– Name: AbstractSuppliedCopyright
  Label:
  Group: Ab
  Data: <i>Copyright of Surface & Coatings Technology is the property of Elsevier B.V. and its content may not be copied or emailed to multiple sites without the copyright holder's express written permission. Additionally, content may not be used with any artificial intelligence tools or machine learning technologies. However, users may print, download, or email articles for individual use. This abstract may be abridged. No warranty is given about the accuracy of the copy. Users should refer to the original published version of the material for the full abstract.</i> (Copyright applies to all Abstracts.)
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RecordInfo BibRecord:
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      – Type: doi
        Value: 10.1016/j.surfcoat.2025.133104
    Languages:
      – Code: eng
        Text: English
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      Pagination:
        PageCount: 1
        StartPage: N.PAG
    Subjects:
      – SubjectFull: Radiofrequency sputtering
        Type: general
      – SubjectFull: Magnetron sputtering
        Type: general
      – SubjectFull: Thin films
        Type: general
      – SubjectFull: Current-voltage characteristics
        Type: general
      – SubjectFull: Sputtering (Physics)
        Type: general
      – SubjectFull: Plasma oscillations
        Type: general
      – SubjectFull: Electric arc
        Type: general
    Titles:
      – TitleFull: Continuous superposition of high power pulses and radio frequency power on a single magnetron target.
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            NameFull: Müller, J.
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            – D: 01
              M: 02
              Text: Feb2026
              Type: published
              Y: 2026
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              Value: 521
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