Size-Dependent Emission Enhancement in Deep-Ultraviolet AlGaN Microrods.
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| Title: | Size-Dependent Emission Enhancement in Deep-Ultraviolet AlGaN Microrods. |
|---|---|
| Authors: | Sun, Xu1 (AUTHOR), Yan, Ziwen1 (AUTHOR), Xu, Tong1 (AUTHOR), Zhu, Jiajun1 (AUTHOR), Xie, Zili1 (AUTHOR), Xiu, Xiangqian1 (AUTHOR), Chen, Dunjun1 (AUTHOR), Liu, Bin1 (AUTHOR), Shi, Yi1 (AUTHOR), Zhang, Rong1 (AUTHOR), Zheng, Youdou1 (AUTHOR), Chen, Peng1 (AUTHOR) pchen@nju.edu.cn |
| Source: | Nanomaterials (2079-4991). Mar2026, Vol. 16 Issue 6, p355. 13p. |
| Subjects: | Cathodoluminescence, Quantum wells, Ultraviolet radiation, Semiconductor materials, Plasma etching, Radiative transitions, Etching reagents |
| Abstract: | High-Al-content AlGaN microrods represent an effective platform for engineering deep-ultraviolet (DUV) emission. Here, we fabricated AlGaN microrods with varying diameters (2, 3, and 4 μm) via a top-down approach involving inductively coupled plasma dry etching followed by a KOH wet chemical modification. Their crystallographic facets and size-dependent optical properties were systematically investigated using scanning electron microscopy (SEM), cathodoluminescence (CL) spectroscopy, and CL mapping. We found that the KOH treatment selectively forms a-plane-dominated sidewalls on the high-Al-content portion of the microrods, whereas the etch pit bottoms stabilize as m-plane facets. Notably, the CL spectra show that the band-edge emission intensity of the 2 μm microrods is enhanced by a factor of 3.76 compared to the 4 μm structures. CL mapping further unveils the competitive dynamics between radiative recombination within the quantum wells and non-radiative recombination at surface states. These findings pinpoint 2 μm as the optimal diameter among the investigated range for maximizing spontaneous emission from these high-Al-content AlGaN microrods. [ABSTRACT FROM AUTHOR] |
| Copyright of Nanomaterials (2079-4991) is the property of MDPI and its content may not be copied or emailed to multiple sites without the copyright holder's express written permission. Additionally, content may not be used with any artificial intelligence tools or machine learning technologies. However, users may print, download, or email articles for individual use. This abstract may be abridged. No warranty is given about the accuracy of the copy. Users should refer to the original published version of the material for the full abstract. (Copyright applies to all Abstracts.) | |
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| Header | DbId: egs DbLabel: Engineering Source An: 192622489 AccessLevel: 6 PubType: Academic Journal PubTypeId: academicJournal PreciseRelevancyScore: 0 |
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| Items | – Name: Title Label: Title Group: Ti Data: Size-Dependent Emission Enhancement in Deep-Ultraviolet AlGaN Microrods. – Name: Author Label: Authors Group: Au Data: <searchLink fieldCode="AR" term="%22Sun%2C+Xu%22">Sun, Xu</searchLink><relatesTo>1</relatesTo> (AUTHOR)<br /><searchLink fieldCode="AR" term="%22Yan%2C+Ziwen%22">Yan, Ziwen</searchLink><relatesTo>1</relatesTo> (AUTHOR)<br /><searchLink fieldCode="AR" term="%22Xu%2C+Tong%22">Xu, Tong</searchLink><relatesTo>1</relatesTo> (AUTHOR)<br /><searchLink fieldCode="AR" term="%22Zhu%2C+Jiajun%22">Zhu, Jiajun</searchLink><relatesTo>1</relatesTo> (AUTHOR)<br /><searchLink fieldCode="AR" term="%22Xie%2C+Zili%22">Xie, Zili</searchLink><relatesTo>1</relatesTo> (AUTHOR)<br /><searchLink fieldCode="AR" term="%22Xiu%2C+Xiangqian%22">Xiu, Xiangqian</searchLink><relatesTo>1</relatesTo> (AUTHOR)<br /><searchLink fieldCode="AR" term="%22Chen%2C+Dunjun%22">Chen, Dunjun</searchLink><relatesTo>1</relatesTo> (AUTHOR)<br /><searchLink fieldCode="AR" term="%22Liu%2C+Bin%22">Liu, Bin</searchLink><relatesTo>1</relatesTo> (AUTHOR)<br /><searchLink fieldCode="AR" term="%22Shi%2C+Yi%22">Shi, Yi</searchLink><relatesTo>1</relatesTo> (AUTHOR)<br /><searchLink fieldCode="AR" term="%22Zhang%2C+Rong%22">Zhang, Rong</searchLink><relatesTo>1</relatesTo> (AUTHOR)<br /><searchLink fieldCode="AR" term="%22Zheng%2C+Youdou%22">Zheng, Youdou</searchLink><relatesTo>1</relatesTo> (AUTHOR)<br /><searchLink fieldCode="AR" term="%22Chen%2C+Peng%22">Chen, Peng</searchLink><relatesTo>1</relatesTo> (AUTHOR)<i> pchen@nju.edu.cn</i> – Name: TitleSource Label: Source Group: Src Data: <searchLink fieldCode="JN" term="%22Nanomaterials+%282079-4991%29%22">Nanomaterials (2079-4991)</searchLink>. Mar2026, Vol. 16 Issue 6, p355. 13p. – Name: Subject Label: Subjects Group: Su Data: <searchLink fieldCode="DE" term="%22Cathodoluminescence%22">Cathodoluminescence</searchLink><br /><searchLink fieldCode="DE" term="%22Quantum+wells%22">Quantum wells</searchLink><br /><searchLink fieldCode="DE" term="%22Ultraviolet+radiation%22">Ultraviolet radiation</searchLink><br /><searchLink fieldCode="DE" term="%22Semiconductor+materials%22">Semiconductor materials</searchLink><br /><searchLink fieldCode="DE" term="%22Plasma+etching%22">Plasma etching</searchLink><br /><searchLink fieldCode="DE" term="%22Radiative+transitions%22">Radiative transitions</searchLink><br /><searchLink fieldCode="DE" term="%22Etching+reagents%22">Etching reagents</searchLink> – Name: Abstract Label: Abstract Group: Ab Data: High-Al-content AlGaN microrods represent an effective platform for engineering deep-ultraviolet (DUV) emission. Here, we fabricated AlGaN microrods with varying diameters (2, 3, and 4 μm) via a top-down approach involving inductively coupled plasma dry etching followed by a KOH wet chemical modification. Their crystallographic facets and size-dependent optical properties were systematically investigated using scanning electron microscopy (SEM), cathodoluminescence (CL) spectroscopy, and CL mapping. We found that the KOH treatment selectively forms a-plane-dominated sidewalls on the high-Al-content portion of the microrods, whereas the etch pit bottoms stabilize as m-plane facets. Notably, the CL spectra show that the band-edge emission intensity of the 2 μm microrods is enhanced by a factor of 3.76 compared to the 4 μm structures. CL mapping further unveils the competitive dynamics between radiative recombination within the quantum wells and non-radiative recombination at surface states. These findings pinpoint 2 μm as the optimal diameter among the investigated range for maximizing spontaneous emission from these high-Al-content AlGaN microrods. [ABSTRACT FROM AUTHOR] – Name: AbstractSuppliedCopyright Label: Group: Ab Data: <i>Copyright of Nanomaterials (2079-4991) is the property of MDPI and its content may not be copied or emailed to multiple sites without the copyright holder's express written permission. Additionally, content may not be used with any artificial intelligence tools or machine learning technologies. However, users may print, download, or email articles for individual use. This abstract may be abridged. No warranty is given about the accuracy of the copy. Users should refer to the original published version of the material for the full abstract.</i> (Copyright applies to all Abstracts.) |
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| RecordInfo | BibRecord: BibEntity: Identifiers: – Type: doi Value: 10.3390/nano16060355 Languages: – Code: eng Text: English PhysicalDescription: Pagination: PageCount: 13 StartPage: 355 Subjects: – SubjectFull: Cathodoluminescence Type: general – SubjectFull: Quantum wells Type: general – SubjectFull: Ultraviolet radiation Type: general – SubjectFull: Semiconductor materials Type: general – SubjectFull: Plasma etching Type: general – SubjectFull: Radiative transitions Type: general – SubjectFull: Etching reagents Type: general Titles: – TitleFull: Size-Dependent Emission Enhancement in Deep-Ultraviolet AlGaN Microrods. Type: main BibRelationships: HasContributorRelationships: – PersonEntity: Name: NameFull: Sun, Xu – PersonEntity: Name: NameFull: Yan, Ziwen – PersonEntity: Name: NameFull: Xu, Tong – PersonEntity: Name: NameFull: Zhu, Jiajun – PersonEntity: Name: NameFull: Xie, Zili – PersonEntity: Name: NameFull: Xiu, Xiangqian – PersonEntity: Name: NameFull: Chen, Dunjun – PersonEntity: Name: NameFull: Liu, Bin – PersonEntity: Name: NameFull: Shi, Yi – PersonEntity: Name: NameFull: Zhang, Rong – PersonEntity: Name: NameFull: Zheng, Youdou – PersonEntity: Name: NameFull: Chen, Peng IsPartOfRelationships: – BibEntity: Dates: – D: 15 M: 03 Text: Mar2026 Type: published Y: 2026 Identifiers: – Type: issn-print Value: 20794991 Numbering: – Type: volume Value: 16 – Type: issue Value: 6 Titles: – TitleFull: Nanomaterials (2079-4991) Type: main |
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