Bibliographic Details
| Title: |
Electro-thermal analysis of device geometry dependence on the amorphous cap size in phase change memory devices. |
| Authors: |
Mishra, Amiya Kumar1 (AUTHOR), Pandey, Shivendra Kumar1 (AUTHOR) skpandey@ei.nits.ac.in |
| Source: |
Semiconductor Science & Technology. 2026, Vol. 41 Issue 5, p1-9. 9p. |
| Subjects: |
Phase change memory, Phase change materials, Thermoelectric effects, Thermoelectricity, Finite element method |
| Abstract: |
We present the footprint of amorphous cap thickness (A T) to facilitate intermediate resistance inside the Phase change memory (PCM) devices with varying geometric parameters, employing electro-thermal analysis. A 2D finite element simulation with axis symmetry is employed to analyze the electro-thermal effect on the PCM device using Ge2Sb2Te5 (GST) as a phase change material. The thermoelectric effects inside the GST are calculated using the material with temperature-dependent features. The overall device performance can be optimized through precise tuning of geometrical parameters. A substantial increase in local temperature profile for the three devices was achieved by varying the amplitude of high-resistance state pulses from 1.6 V to 2.4 V, with a pulse width of 25 ns. When the heater increases and the L GST decreases, a reduced A T of 30.8 nm is observed. Conversely, reversing these dimensions results in a substantially larger cap thickness of 64 nm. An intermediate cap thickness of 48 nm is obtained when both L heater and L GST are the same. A thicker amorphous cap leads to a lower peak temperature. Device 2 (L heater < L GST) exhibits a peak resistance of 16.45 MΩ, with Device 1 (L heater ≈ L GST) and Device 3 (L heater > L GST) showing 23.6% and 52% lower values, respectively. These findings are helpful to achieve the multi-bit operations inside the device, which is suitable to emulate the biological synapse. [ABSTRACT FROM AUTHOR] |
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| Database: |
Engineering Source |