A New Paradigm of Magnetron Target Design.
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| Title: | A New Paradigm of Magnetron Target Design. |
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| Authors: | Shapovalov, Viktor I.1 (AUTHOR) vishapovalov@mail.ru, Sharkovskii, Daniil S.1 (AUTHOR), Zephaniah, Joshua K.1 (AUTHOR), Nikolaev, Arseniy V.1 (AUTHOR) |
| Source: | Nanomaterials (2079-4991). May2026, Vol. 16 Issue 9, p543. 17p. |
| Subjects: | Magnetron sputtering, Sputtering (Physics), High-entropy alloys, Metallic thin films, Nanostructured materials |
| Abstract: | This communication discusses the problem of depositing equiatomic metal alloy films. It is shown that this problem can be solved using a magnetron equipped with a target constructed using a new "multilayer target" paradigm. This target, sputtered in an argon environment, consists of several parallel metal plates mounted on the magnetron axis. A method based on the equality of the sputtered fluxes generated by the plates is proposed for calculating the geometric dimensions of the plates. This equality leads to a system of algebraic equations, which are proposed to be solved under the assumption of a uniform discharge current density distribution in the sputtering region of the target. The communication describes two types of targets in which the plates have slots of different shapes. In one case, the slots are shaped as sectors of a ring with a given angle. In the other, the plates are shaped as rings. As examples, the geometric dimensions of targets for a balanced magnetron system intended for the deposition of films of equiatomic Ti0.33Ta0.33Nb0.33 and Ti0.25Ta0.25Nb0.25Mo0.25 alloys are calculated. The presentation is accompanied by the results of individual experiments. This report is preliminary in nature; experimental verification is ongoing. The application of the new paradigm in magnetron target design facilitates the fabrication of films of nanostructured medium- and high-entropy alloys with specified chemical compositions, which is the central theme of the Special Issue devoted to functional nanomaterials. [ABSTRACT FROM AUTHOR] |
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| Database: | Engineering Source |
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| Abstract: | This communication discusses the problem of depositing equiatomic metal alloy films. It is shown that this problem can be solved using a magnetron equipped with a target constructed using a new "multilayer target" paradigm. This target, sputtered in an argon environment, consists of several parallel metal plates mounted on the magnetron axis. A method based on the equality of the sputtered fluxes generated by the plates is proposed for calculating the geometric dimensions of the plates. This equality leads to a system of algebraic equations, which are proposed to be solved under the assumption of a uniform discharge current density distribution in the sputtering region of the target. The communication describes two types of targets in which the plates have slots of different shapes. In one case, the slots are shaped as sectors of a ring with a given angle. In the other, the plates are shaped as rings. As examples, the geometric dimensions of targets for a balanced magnetron system intended for the deposition of films of equiatomic Ti0.33Ta0.33Nb0.33 and Ti0.25Ta0.25Nb0.25Mo0.25 alloys are calculated. The presentation is accompanied by the results of individual experiments. This report is preliminary in nature; experimental verification is ongoing. The application of the new paradigm in magnetron target design facilitates the fabrication of films of nanostructured medium- and high-entropy alloys with specified chemical compositions, which is the central theme of the Special Issue devoted to functional nanomaterials. [ABSTRACT FROM AUTHOR] |
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| ISSN: | 20794991 |
| DOI: | 10.3390/nano16090543 |
