A New Paradigm of Magnetron Target Design.
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| Title: | A New Paradigm of Magnetron Target Design. |
|---|---|
| Authors: | Shapovalov, Viktor I.1 (AUTHOR) vishapovalov@mail.ru, Sharkovskii, Daniil S.1 (AUTHOR), Zephaniah, Joshua K.1 (AUTHOR), Nikolaev, Arseniy V.1 (AUTHOR) |
| Source: | Nanomaterials (2079-4991). May2026, Vol. 16 Issue 9, p543. 17p. |
| Subjects: | Magnetron sputtering, Sputtering (Physics), High-entropy alloys, Metallic thin films, Nanostructured materials |
| Abstract: | This communication discusses the problem of depositing equiatomic metal alloy films. It is shown that this problem can be solved using a magnetron equipped with a target constructed using a new "multilayer target" paradigm. This target, sputtered in an argon environment, consists of several parallel metal plates mounted on the magnetron axis. A method based on the equality of the sputtered fluxes generated by the plates is proposed for calculating the geometric dimensions of the plates. This equality leads to a system of algebraic equations, which are proposed to be solved under the assumption of a uniform discharge current density distribution in the sputtering region of the target. The communication describes two types of targets in which the plates have slots of different shapes. In one case, the slots are shaped as sectors of a ring with a given angle. In the other, the plates are shaped as rings. As examples, the geometric dimensions of targets for a balanced magnetron system intended for the deposition of films of equiatomic Ti0.33Ta0.33Nb0.33 and Ti0.25Ta0.25Nb0.25Mo0.25 alloys are calculated. The presentation is accompanied by the results of individual experiments. This report is preliminary in nature; experimental verification is ongoing. The application of the new paradigm in magnetron target design facilitates the fabrication of films of nanostructured medium- and high-entropy alloys with specified chemical compositions, which is the central theme of the Special Issue devoted to functional nanomaterials. [ABSTRACT FROM AUTHOR] |
| Copyright of Nanomaterials (2079-4991) is the property of MDPI and its content may not be copied or emailed to multiple sites without the copyright holder's express written permission. Additionally, content may not be used with any artificial intelligence tools or machine learning technologies. However, users may print, download, or email articles for individual use. This abstract may be abridged. No warranty is given about the accuracy of the copy. Users should refer to the original published version of the material for the full abstract. (Copyright applies to all Abstracts.) | |
| Database: | Engineering Source |
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| Header | DbId: egs DbLabel: Engineering Source An: 193717476 AccessLevel: 6 PubType: Academic Journal PubTypeId: academicJournal PreciseRelevancyScore: 0 |
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| Items | – Name: Title Label: Title Group: Ti Data: A New Paradigm of Magnetron Target Design. – Name: Author Label: Authors Group: Au Data: <searchLink fieldCode="AR" term="%22Shapovalov%2C+Viktor+I%2E%22">Shapovalov, Viktor I.</searchLink><relatesTo>1</relatesTo> (AUTHOR)<i> vishapovalov@mail.ru</i><br /><searchLink fieldCode="AR" term="%22Sharkovskii%2C+Daniil+S%2E%22">Sharkovskii, Daniil S.</searchLink><relatesTo>1</relatesTo> (AUTHOR)<br /><searchLink fieldCode="AR" term="%22Zephaniah%2C+Joshua+K%2E%22">Zephaniah, Joshua K.</searchLink><relatesTo>1</relatesTo> (AUTHOR)<br /><searchLink fieldCode="AR" term="%22Nikolaev%2C+Arseniy+V%2E%22">Nikolaev, Arseniy V.</searchLink><relatesTo>1</relatesTo> (AUTHOR) – Name: TitleSource Label: Source Group: Src Data: <searchLink fieldCode="JN" term="%22Nanomaterials+%282079-4991%29%22">Nanomaterials (2079-4991)</searchLink>. May2026, Vol. 16 Issue 9, p543. 17p. – Name: Subject Label: Subjects Group: Su Data: <searchLink fieldCode="DE" term="%22Magnetron+sputtering%22">Magnetron sputtering</searchLink><br /><searchLink fieldCode="DE" term="%22Sputtering+%28Physics%29%22">Sputtering (Physics)</searchLink><br /><searchLink fieldCode="DE" term="%22High-entropy+alloys%22">High-entropy alloys</searchLink><br /><searchLink fieldCode="DE" term="%22Metallic+thin+films%22">Metallic thin films</searchLink><br /><searchLink fieldCode="DE" term="%22Nanostructured+materials%22">Nanostructured materials</searchLink> – Name: Abstract Label: Abstract Group: Ab Data: This communication discusses the problem of depositing equiatomic metal alloy films. It is shown that this problem can be solved using a magnetron equipped with a target constructed using a new "multilayer target" paradigm. This target, sputtered in an argon environment, consists of several parallel metal plates mounted on the magnetron axis. A method based on the equality of the sputtered fluxes generated by the plates is proposed for calculating the geometric dimensions of the plates. This equality leads to a system of algebraic equations, which are proposed to be solved under the assumption of a uniform discharge current density distribution in the sputtering region of the target. The communication describes two types of targets in which the plates have slots of different shapes. In one case, the slots are shaped as sectors of a ring with a given angle. In the other, the plates are shaped as rings. As examples, the geometric dimensions of targets for a balanced magnetron system intended for the deposition of films of equiatomic Ti0.33Ta0.33Nb0.33 and Ti0.25Ta0.25Nb0.25Mo0.25 alloys are calculated. The presentation is accompanied by the results of individual experiments. This report is preliminary in nature; experimental verification is ongoing. The application of the new paradigm in magnetron target design facilitates the fabrication of films of nanostructured medium- and high-entropy alloys with specified chemical compositions, which is the central theme of the Special Issue devoted to functional nanomaterials. [ABSTRACT FROM AUTHOR] – Name: AbstractSuppliedCopyright Label: Group: Ab Data: <i>Copyright of Nanomaterials (2079-4991) is the property of MDPI and its content may not be copied or emailed to multiple sites without the copyright holder's express written permission. Additionally, content may not be used with any artificial intelligence tools or machine learning technologies. However, users may print, download, or email articles for individual use. This abstract may be abridged. No warranty is given about the accuracy of the copy. Users should refer to the original published version of the material for the full abstract.</i> (Copyright applies to all Abstracts.) |
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| RecordInfo | BibRecord: BibEntity: Identifiers: – Type: doi Value: 10.3390/nano16090543 Languages: – Code: eng Text: English PhysicalDescription: Pagination: PageCount: 17 StartPage: 543 Subjects: – SubjectFull: Magnetron sputtering Type: general – SubjectFull: Sputtering (Physics) Type: general – SubjectFull: High-entropy alloys Type: general – SubjectFull: Metallic thin films Type: general – SubjectFull: Nanostructured materials Type: general Titles: – TitleFull: A New Paradigm of Magnetron Target Design. Type: main BibRelationships: HasContributorRelationships: – PersonEntity: Name: NameFull: Shapovalov, Viktor I. – PersonEntity: Name: NameFull: Sharkovskii, Daniil S. – PersonEntity: Name: NameFull: Zephaniah, Joshua K. – PersonEntity: Name: NameFull: Nikolaev, Arseniy V. IsPartOfRelationships: – BibEntity: Dates: – D: 01 M: 05 Text: May2026 Type: published Y: 2026 Identifiers: – Type: issn-print Value: 20794991 Numbering: – Type: volume Value: 16 – Type: issue Value: 9 Titles: – TitleFull: Nanomaterials (2079-4991) Type: main |
| ResultId | 1 |
