GaN lateral pn junctions by MBE in situ selective area sublimation and regrowth.
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| Title: | GaN lateral pn junctions by MBE in situ selective area sublimation and regrowth. |
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| Authors: | Murarka, Hardik1 (AUTHOR), Arora, Jayeesh1 (AUTHOR) ja828@cornell.edu, Ramesh, Madhav2 (AUTHOR), Nguyen, Thai-Son1 (AUTHOR), Bhattacharya, Debaditya2 (AUTHOR), Smith, Kathleen3 (AUTHOR), Savant, Chandrashekhar1 (AUTHOR), Encomendero, Jimy2 (AUTHOR), Protasenko, Vladimir2 (AUTHOR), Xing, Huili Grace1,2,4 (AUTHOR), Jena, Debdeep1,2,4 (AUTHOR) djena@cornell.edu |
| Source: | Journal of Vacuum Science & Technology: Part A-Vacuums, Surfaces & Films. May2026, Vol. 44 Issue 3, p1-7. 7p. |
| Subjects: | Molecular beam epitaxy, Semiconductor junctions, Vacuum technology, Gallium nitride, Electroluminescence |
| Abstract: | We present a technique of patterned in situ molecular beam epitaxy (MBE) selective area sublimation etching of p-type GaN and direct MBE regrowth of n-type GaN to form lateral pn junction structures without air exposure of the junction region. The Mg-doped p-GaN has 2.1 × 10 18 / cm 3 mobile holes of mobility 4 cm 2 /V s and the Si-doped n-GaN has 3 × 10 18 / cm 3 mobile electrons of mobility >100 cm 2 /V s, both at room temperature. The resulting lateral pn junction exhibits rectification and GaN band-edge electroluminescence at 3.4 eV at forward bias, in addition to blue electroluminescence associated with Mg-doped GaN. We systematically describe the entire MBE etch and regrowth process and expect this vacuum-based technique to enable lateral structures of higher complexity than shown in this initial demonstration. [ABSTRACT FROM AUTHOR] |
| Copyright of Journal of Vacuum Science & Technology: Part A-Vacuums, Surfaces & Films is the property of American Institute of Physics and its content may not be copied or emailed to multiple sites without the copyright holder's express written permission. Additionally, content may not be used with any artificial intelligence tools or machine learning technologies. However, users may print, download, or email articles for individual use. This abstract may be abridged. No warranty is given about the accuracy of the copy. Users should refer to the original published version of the material for the full abstract. (Copyright applies to all Abstracts.) | |
| Database: | Engineering Source |
| FullText | Text: Availability: 0 |
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| Header | DbId: egs DbLabel: Engineering Source An: 194305180 AccessLevel: 6 PubType: Academic Journal PubTypeId: academicJournal PreciseRelevancyScore: 0 |
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| Items | – Name: Title Label: Title Group: Ti Data: GaN lateral pn junctions by MBE in situ selective area sublimation and regrowth. – Name: Author Label: Authors Group: Au Data: <searchLink fieldCode="AR" term="%22Murarka%2C+Hardik%22">Murarka, Hardik</searchLink><relatesTo>1</relatesTo> (AUTHOR)<br /><searchLink fieldCode="AR" term="%22Arora%2C+Jayeesh%22">Arora, Jayeesh</searchLink><relatesTo>1</relatesTo> (AUTHOR)<i> ja828@cornell.edu</i><br /><searchLink fieldCode="AR" term="%22Ramesh%2C+Madhav%22">Ramesh, Madhav</searchLink><relatesTo>2</relatesTo> (AUTHOR)<br /><searchLink fieldCode="AR" term="%22Nguyen%2C+Thai-Son%22">Nguyen, Thai-Son</searchLink><relatesTo>1</relatesTo> (AUTHOR)<br /><searchLink fieldCode="AR" term="%22Bhattacharya%2C+Debaditya%22">Bhattacharya, Debaditya</searchLink><relatesTo>2</relatesTo> (AUTHOR)<br /><searchLink fieldCode="AR" term="%22Smith%2C+Kathleen%22">Smith, Kathleen</searchLink><relatesTo>3</relatesTo> (AUTHOR)<br /><searchLink fieldCode="AR" term="%22Savant%2C+Chandrashekhar%22">Savant, Chandrashekhar</searchLink><relatesTo>1</relatesTo> (AUTHOR)<br /><searchLink fieldCode="AR" term="%22Encomendero%2C+Jimy%22">Encomendero, Jimy</searchLink><relatesTo>2</relatesTo> (AUTHOR)<br /><searchLink fieldCode="AR" term="%22Protasenko%2C+Vladimir%22">Protasenko, Vladimir</searchLink><relatesTo>2</relatesTo> (AUTHOR)<br /><searchLink fieldCode="AR" term="%22Xing%2C+Huili+Grace%22">Xing, Huili Grace</searchLink><relatesTo>1,2,4</relatesTo> (AUTHOR)<br /><searchLink fieldCode="AR" term="%22Jena%2C+Debdeep%22">Jena, Debdeep</searchLink><relatesTo>1,2,4</relatesTo> (AUTHOR)<i> djena@cornell.edu</i> – Name: TitleSource Label: Source Group: Src Data: <searchLink fieldCode="JN" term="%22Journal+of+Vacuum+Science+%26+Technology%3A+Part+A-Vacuums%2C+Surfaces+%26+Films%22">Journal of Vacuum Science & Technology: Part A-Vacuums, Surfaces & Films</searchLink>. May2026, Vol. 44 Issue 3, p1-7. 7p. – Name: Subject Label: Subjects Group: Su Data: <searchLink fieldCode="DE" term="%22Molecular+beam+epitaxy%22">Molecular beam epitaxy</searchLink><br /><searchLink fieldCode="DE" term="%22Semiconductor+junctions%22">Semiconductor junctions</searchLink><br /><searchLink fieldCode="DE" term="%22Vacuum+technology%22">Vacuum technology</searchLink><br /><searchLink fieldCode="DE" term="%22Gallium+nitride%22">Gallium nitride</searchLink><br /><searchLink fieldCode="DE" term="%22Electroluminescence%22">Electroluminescence</searchLink> – Name: Abstract Label: Abstract Group: Ab Data: We present a technique of patterned in situ molecular beam epitaxy (MBE) selective area sublimation etching of p-type GaN and direct MBE regrowth of n-type GaN to form lateral pn junction structures without air exposure of the junction region. The Mg-doped p-GaN has 2.1 × 10 18 / cm 3 mobile holes of mobility 4 cm 2 /V s and the Si-doped n-GaN has 3 × 10 18 / cm 3 mobile electrons of mobility >100 cm 2 /V s, both at room temperature. The resulting lateral pn junction exhibits rectification and GaN band-edge electroluminescence at 3.4 eV at forward bias, in addition to blue electroluminescence associated with Mg-doped GaN. We systematically describe the entire MBE etch and regrowth process and expect this vacuum-based technique to enable lateral structures of higher complexity than shown in this initial demonstration. [ABSTRACT FROM AUTHOR] – Name: AbstractSuppliedCopyright Label: Group: Ab Data: <i>Copyright of Journal of Vacuum Science & Technology: Part A-Vacuums, Surfaces & Films is the property of American Institute of Physics and its content may not be copied or emailed to multiple sites without the copyright holder's express written permission. Additionally, content may not be used with any artificial intelligence tools or machine learning technologies. However, users may print, download, or email articles for individual use. This abstract may be abridged. No warranty is given about the accuracy of the copy. Users should refer to the original published version of the material for the full abstract.</i> (Copyright applies to all Abstracts.) |
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| RecordInfo | BibRecord: BibEntity: Identifiers: – Type: doi Value: 10.1116/6.0005402 Languages: – Code: eng Text: English PhysicalDescription: Pagination: PageCount: 7 StartPage: 1 Subjects: – SubjectFull: Molecular beam epitaxy Type: general – SubjectFull: Semiconductor junctions Type: general – SubjectFull: Vacuum technology Type: general – SubjectFull: Gallium nitride Type: general – SubjectFull: Electroluminescence Type: general Titles: – TitleFull: GaN lateral pn junctions by MBE in situ selective area sublimation and regrowth. Type: main BibRelationships: HasContributorRelationships: – PersonEntity: Name: NameFull: Murarka, Hardik – PersonEntity: Name: NameFull: Arora, Jayeesh – PersonEntity: Name: NameFull: Ramesh, Madhav – PersonEntity: Name: NameFull: Nguyen, Thai-Son – PersonEntity: Name: NameFull: Bhattacharya, Debaditya – PersonEntity: Name: NameFull: Smith, Kathleen – PersonEntity: Name: NameFull: Savant, Chandrashekhar – PersonEntity: Name: NameFull: Encomendero, Jimy – PersonEntity: Name: NameFull: Protasenko, Vladimir – PersonEntity: Name: NameFull: Xing, Huili Grace – PersonEntity: Name: NameFull: Jena, Debdeep IsPartOfRelationships: – BibEntity: Dates: – D: 01 M: 05 Text: May2026 Type: published Y: 2026 Identifiers: – Type: issn-print Value: 07342101 Numbering: – Type: volume Value: 44 – Type: issue Value: 3 Titles: – TitleFull: Journal of Vacuum Science & Technology: Part A-Vacuums, Surfaces & Films Type: main |
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