APA (7th ed.) Citation

Liang, E., Huang, C., & Lin, C. (2006). Use of SiO2 nanoparticles as etch mask to generate Si nanorods by reactive ion etch. Journal of Vacuum Science & Technology: Part B-Microelectronics & Nanometer Structures, 24(2), 599. https://doi.org/10.1116/1.2172251

Chicago Style (17th ed.) Citation

Liang, Eih-Zhe, Chao-Jei Huang, and Ching-Fuh Lin. "Use of SiO2 Nanoparticles as Etch Mask to Generate Si Nanorods by Reactive Ion Etch." Journal of Vacuum Science & Technology: Part B-Microelectronics & Nanometer Structures 24, no. 2 (2006): 599. https://doi.org/10.1116/1.2172251.

MLA (9th ed.) Citation

Liang, Eih-Zhe, et al. "Use of SiO2 Nanoparticles as Etch Mask to Generate Si Nanorods by Reactive Ion Etch." Journal of Vacuum Science & Technology: Part B-Microelectronics & Nanometer Structures, vol. 24, no. 2, 2006, p. 599, https://doi.org/10.1116/1.2172251.