Fabrication of nanoelectromechanical resonators using a cryogenic etching technique.

Saved in:
Bibliographic Details
Title: Fabrication of nanoelectromechanical resonators using a cryogenic etching technique.
Authors: Nelson-Fitzpatrick, N.1,2, Westra, K.3, Li, P.4, McColman, S.3, Wilding, N.1,2, Evoy, S.1,2 evoy@ece.ualberta.ca
Source: Journal of Vacuum Science & Technology: Part B-Microelectronics & Nanometer Structures. Nov/Dec2006, Vol. 24 Issue 6, p2769-2771. 3p. 1 Black and White Photograph, 1 Diagram, 2 Charts, 1 Graph.
Subjects: Cryoelectronics, Etching, Electric resonators, Machining, Low temperature engineering
Abstract: The article presents a study which explored the application of cryogenic etching for the machining of released high-aspect-ratio nanoelectromechanical systems resonators. The cryogenic nanomechanical etching methodology is described in detail. The preliminary characterization of resonators machined in such a way is reported. The conclusion of the study is stated.
Database: Engineering Source
Be the first to leave a comment!
You must be logged in first