Contact Angle Hysteresis on Regular Pillar-like Hydrophobic Surfaces.

Saved in:
Bibliographic Details
Title: Contact Angle Hysteresis on Regular Pillar-like Hydrophobic Surfaces.
Authors: Kuan-Yu Yeh1, Li-Jen Chen1, Jeng-Yang Chang1
Source: Langmuir. Jan2008, Vol. 24 Issue 1, p245-251. 7p.
Subjects: Hydrophobic surfaces, Hysteresis, Photolithography, Monomolecular films
Abstract: A series of pillar-like patterned silicon wafers with different pillar sizes and spacing are fabricated by photolithography and further modified by a self-assembled fluorosilanated monolayer. The dynamic contact angles of water on these surfaces are carefully measured and found to be consistent with the theoretical predictions of the Cassie model and the Wenzel model. When a water drop is at the Wenzel state, its contact angle hysteresis increases along with an increase in the surface roughness. While the surface roughness is further raised beyond its transition roughness (from the Wenzel state to the Cassie state), the contact angle hysteresis (or receding contact angle) discontinuously drops (or jumps) to a lower (or higher) value. When a water drop is at the Cassie state, its contact angle hysteresis strongly depends on the solid fraction and has nothing to do with the surface roughness. Even for a superhydrophobic surface, the contact angle hysteresis may still exhibit a value as high as 41° for the solid fraction of 0.563. [ABSTRACT FROM AUTHOR]
Copyright of Langmuir is the property of American Chemical Society and its content may not be copied or emailed to multiple sites without the copyright holder's express written permission. Additionally, content may not be used with any artificial intelligence tools or machine learning technologies. However, users may print, download, or email articles for individual use. This abstract may be abridged. No warranty is given about the accuracy of the copy. Users should refer to the original published version of the material for the full abstract. (Copyright applies to all Abstracts.)
Database: Engineering Source
Description
Abstract:A series of pillar-like patterned silicon wafers with different pillar sizes and spacing are fabricated by photolithography and further modified by a self-assembled fluorosilanated monolayer. The dynamic contact angles of water on these surfaces are carefully measured and found to be consistent with the theoretical predictions of the Cassie model and the Wenzel model. When a water drop is at the Wenzel state, its contact angle hysteresis increases along with an increase in the surface roughness. While the surface roughness is further raised beyond its transition roughness (from the Wenzel state to the Cassie state), the contact angle hysteresis (or receding contact angle) discontinuously drops (or jumps) to a lower (or higher) value. When a water drop is at the Cassie state, its contact angle hysteresis strongly depends on the solid fraction and has nothing to do with the surface roughness. Even for a superhydrophobic surface, the contact angle hysteresis may still exhibit a value as high as 41° for the solid fraction of 0.563. [ABSTRACT FROM AUTHOR]
ISSN:07437463
DOI:10.1021/la7020337