Advanced Defect Characterization by STEM Analysis.
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| Title: | Advanced Defect Characterization by STEM Analysis. |
|---|---|
| Authors: | Subramanian, Sam1 Sam.Subramanian@freescale.com, Rai, Raghaw, Kiem Ly, Chrastecky, Tony, Mulder, Randy, Harber, Kieth |
| Source: | Electronic Device Failure Analysis. May2008, Vol. 10 Issue 2, p20-28. 6p. |
| Subjects: | Semiconductor characterization, Scanning transmission electron microscopy, Transmission electron microscopy, Semiconductor defects, Failure analysis, Quality control, Optical diffraction, Surface defects, Semiconductor industry |
| Abstract: | The article provides information on the advantages of scanning transmission electron microscopy (STEM) for semiconductor defect characterization. The author stated that useful data for complete defect characterization of samples that are encountered in failure analysis (FA) of semiconductor devices are generated by a complementary approach of STEM and conventional transmission electron microscopy (TEM). Meanwhile, the advantages of Z-contrast STEM imaging can be used to image subtle defects that are difficult to characterize by conventional diffraction and phase-contrast imaging. |
| Database: | Engineering Source |
| FullText | Links: – Type: pdflink Text: Availability: 0 |
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| Header | DbId: egs DbLabel: Engineering Source An: 33012919 AccessLevel: 6 PubType: Academic Journal PubTypeId: academicJournal PreciseRelevancyScore: 0 |
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| Items | – Name: Title Label: Title Group: Ti Data: Advanced Defect Characterization by STEM Analysis. – Name: Author Label: Authors Group: Au Data: <searchLink fieldCode="AR" term="%22Subramanian%2C+Sam%22">Subramanian, Sam</searchLink><relatesTo>1</relatesTo><i> Sam.Subramanian@freescale.com</i><br /><searchLink fieldCode="AR" term="%22Rai%2C+Raghaw%22">Rai, Raghaw</searchLink><br /><searchLink fieldCode="AR" term="%22Kiem+Ly%22">Kiem Ly</searchLink><br /><searchLink fieldCode="AR" term="%22Chrastecky%2C+Tony%22">Chrastecky, Tony</searchLink><br /><searchLink fieldCode="AR" term="%22Mulder%2C+Randy%22">Mulder, Randy</searchLink><br /><searchLink fieldCode="AR" term="%22Harber%2C+Kieth%22">Harber, Kieth</searchLink> – Name: TitleSource Label: Source Group: Src Data: <searchLink fieldCode="JN" term="%22Electronic+Device+Failure+Analysis%22">Electronic Device Failure Analysis</searchLink>. May2008, Vol. 10 Issue 2, p20-28. 6p. – Name: Subject Label: Subjects Group: Su Data: <searchLink fieldCode="DE" term="%22Semiconductor+characterization%22">Semiconductor characterization</searchLink><br /><searchLink fieldCode="DE" term="%22Scanning+transmission+electron+microscopy%22">Scanning transmission electron microscopy</searchLink><br /><searchLink fieldCode="DE" term="%22Transmission+electron+microscopy%22">Transmission electron microscopy</searchLink><br /><searchLink fieldCode="DE" term="%22Semiconductor+defects%22">Semiconductor defects</searchLink><br /><searchLink fieldCode="DE" term="%22Failure+analysis%22">Failure analysis</searchLink><br /><searchLink fieldCode="DE" term="%22Quality+control%22">Quality control</searchLink><br /><searchLink fieldCode="DE" term="%22Optical+diffraction%22">Optical diffraction</searchLink><br /><searchLink fieldCode="DE" term="%22Surface+defects%22">Surface defects</searchLink><br /><searchLink fieldCode="DE" term="%22Semiconductor+industry%22">Semiconductor industry</searchLink> – Name: Abstract Label: Abstract Group: Ab Data: The article provides information on the advantages of scanning transmission electron microscopy (STEM) for semiconductor defect characterization. The author stated that useful data for complete defect characterization of samples that are encountered in failure analysis (FA) of semiconductor devices are generated by a complementary approach of STEM and conventional transmission electron microscopy (TEM). Meanwhile, the advantages of Z-contrast STEM imaging can be used to image subtle defects that are difficult to characterize by conventional diffraction and phase-contrast imaging. |
| PLink | https://search.ebscohost.com/login.aspx?direct=true&site=eds-live&db=egs&AN=33012919 |
| RecordInfo | BibRecord: BibEntity: Identifiers: – Type: doi Value: 10.31399/asm.edfa.2008-2.p020 Languages: – Code: eng Text: English PhysicalDescription: Pagination: PageCount: 6 StartPage: 20 Subjects: – SubjectFull: Semiconductor characterization Type: general – SubjectFull: Scanning transmission electron microscopy Type: general – SubjectFull: Transmission electron microscopy Type: general – SubjectFull: Semiconductor defects Type: general – SubjectFull: Failure analysis Type: general – SubjectFull: Quality control Type: general – SubjectFull: Optical diffraction Type: general – SubjectFull: Surface defects Type: general – SubjectFull: Semiconductor industry Type: general Titles: – TitleFull: Advanced Defect Characterization by STEM Analysis. Type: main BibRelationships: HasContributorRelationships: – PersonEntity: Name: NameFull: Subramanian, Sam – PersonEntity: Name: NameFull: Rai, Raghaw – PersonEntity: Name: NameFull: Kiem Ly – PersonEntity: Name: NameFull: Chrastecky, Tony – PersonEntity: Name: NameFull: Mulder, Randy – PersonEntity: Name: NameFull: Harber, Kieth IsPartOfRelationships: – BibEntity: Dates: – D: 01 M: 05 Text: May2008 Type: published Y: 2008 Identifiers: – Type: issn-print Value: 15370755 Numbering: – Type: volume Value: 10 – Type: issue Value: 2 Titles: – TitleFull: Electronic Device Failure Analysis Type: main |
| ResultId | 1 |