APA (7th ed.) Citation

Wallace, J. (2011). Photomask-optimization model reduces effects of optical aberrations. Laser Focus World, 47(4), 26.

Chicago Style (17th ed.) Citation

Wallace, John. "Photomask-optimization Model Reduces Effects of Optical Aberrations." Laser Focus World 47, no. 4 (2011): 26.

MLA (9th ed.) Citation

Wallace, John. "Photomask-optimization Model Reduces Effects of Optical Aberrations." Laser Focus World, vol. 47, no. 4, 2011, p. 26.