Bibliographic Details
| Title: |
Plasmonic Nanolithography: A Review. |
| Authors: |
Zhihua Xie1,2, Weixing Yu3 yuwx@ciomp.ac.cn, Taisheng Wang, Hongxin Zhang1, Yongqi Fu4 yqfu@uestc.edu.cn, Hua Liu1, Fengyou Li1, Zhenwu Lu1, Qiang Sun1 |
| Source: |
Plasmonics. Sep2011, Vol. 6 Issue 3, p565-580. 16p. 2 Color Photographs, 4 Black and White Photographs, 11 Diagrams, 1 Graph. |
| Subjects: |
Lithography techniques, Surface plasmon resonance, Polaritons, Nanoparticles, Electron beam lithography |
| Abstract: |
Surface plasmon polaritons (SPPs) has attracted great attention in the last decade and recently it has been successfully applied to nanolithography due to its ability of beyond diffraction limit. This article reviews the recent development in plasmonic nanolithography, which is considered as one of the most remarkable technology for next-generation nanolithography. Nanolithography experiments were highlighted on the basis of SPPs effect. Three types of plasmonic nanolithography methods: contact nanolithography, planar lens imaging nanolithography, and direct writing nanolithography were reviewed in detail, and their advantages and shortages are analyzed and compared, respectively. Finally, the development trend of plasmonic nanolithography is suggested. [ABSTRACT FROM AUTHOR] |
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| Database: |
Engineering Source |
