Fabrication of Glass-based Microfluidic Devices with Photoresist as Mask.

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Bibliographic Details
Title: Fabrication of Glass-based Microfluidic Devices with Photoresist as Mask.
Alternate Title: Mikrohidrodinaminių įtaisų stiklo pagrindu su fotorezistu, kuris naudojamas kaip kaukė, gamyba.
Authors: Bahadorimehr, A.1 bahadorimehr@gmail.com, Majlis, B. Y.1 burhan@ukm.my
Source: Electronics & Electrical Engineering. 2011, Issue 116, p45-48. 4p.
Subjects: Glass etching, Microfabrication, Microfluidic devices, Photoresists, Masks (Electronics), Ultraviolet radiation
Abstract (English): This paper presents a low cost method for etching of glass based microfluidic devices. Microchannels with the depth up to 150 µm were achieved by implementing a photoresist and wet etching process. In particular, a photoresist based mask method is introduced for glass etching which can strongly resist against etchant attacks up to 2 hours, showing high adhesion properties on glass substrate for fabrication of microfluidic microchannels. The width of the channels is determined by the width of the lines in photo-mask design and the rate of glass isotropic etching. The channel width range about 30µm to 350µm is fabricated. Commercially available inexpensive microscopic glass slides have been used as substrate. Achieving smooth and clear surface after wet etching process is an important factor for easily flowing fluid through channels and monitoring purposes. It is achieved by implementing special etchant with adding HCL in diluted BOE solution to get smooth and clear surface. The etch rate of the glass strongly depends on the concentration of the etchant. A mixture of different solutions with special ratios has been applied. Finally, typical UV curable glue is utilized for glass-glass bonding. [ABSTRACT FROM AUTHOR]
Abstract (Lithuanian): Pateiktas nebrangus mikrohidrodinaminių įtaisų stiklo pagrindu ėsdinimo metodas. 150 µm gylio mikrokanalai buvo gauti implementuojant fotorezistą ir drėgną ėsdinimo procesą. Fotorezistas naudojamas kaip kaukė stiklui ėsdinti. Jis gali būti atsparus ėsdiklui daugiau nei 2 val. ir išlaiko geras adhezijos savybes gaminant mikrohidrodinaminius kanalus. Kanalų plotis priklauso nuo fotokaukės linijų pločio ir stiklo izotropinio ėsdinimo santykio. Gautas kanalo plotis -- nuo 30 µm iki 350 µm. Lygus ir švarus paviršius po drėgno ėsdinimo yra svarbus veiksnys užtikrinant sklandų skysčių tekėjimą mikrokanalais. Tai pasiekta naudojant specialų ėsdiklį ir pridedant HCL į atskiestą BOE tirpalą. Buvo naudojami įvairių sudėčių tirpalai. [ABSTRACT FROM AUTHOR]
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Database: Engineering Source
Description
Abstract:This paper presents a low cost method for etching of glass based microfluidic devices. Microchannels with the depth up to 150 µm were achieved by implementing a photoresist and wet etching process. In particular, a photoresist based mask method is introduced for glass etching which can strongly resist against etchant attacks up to 2 hours, showing high adhesion properties on glass substrate for fabrication of microfluidic microchannels. The width of the channels is determined by the width of the lines in photo-mask design and the rate of glass isotropic etching. The channel width range about 30µm to 350µm is fabricated. Commercially available inexpensive microscopic glass slides have been used as substrate. Achieving smooth and clear surface after wet etching process is an important factor for easily flowing fluid through channels and monitoring purposes. It is achieved by implementing special etchant with adding HCL in diluted BOE solution to get smooth and clear surface. The etch rate of the glass strongly depends on the concentration of the etchant. A mixture of different solutions with special ratios has been applied. Finally, typical UV curable glue is utilized for glass-glass bonding. [ABSTRACT FROM AUTHOR]
ISSN:13921215
DOI:10.5755/j01.eee.116.10.878