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Fabrication of Glass-based Microfluidic Devices with Photoresist as Mask.

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Title: Fabrication of Glass-based Microfluidic Devices with Photoresist as Mask.
Alternate Title: Mikrohidrodinaminių įtaisų stiklo pagrindu su fotorezistu, kuris naudojamas kaip kaukė, gamyba.
Authors: Bahadorimehr, A.1 bahadorimehr@gmail.com, Majlis, B. Y.1 burhan@ukm.my
Source: Electronics & Electrical Engineering. 2011, Issue 116, p45-48. 4p.
Subjects: Glass etching, Microfabrication, Microfluidic devices, Photoresists, Masks (Electronics), Ultraviolet radiation
Abstract (English): This paper presents a low cost method for etching of glass based microfluidic devices. Microchannels with the depth up to 150 µm were achieved by implementing a photoresist and wet etching process. In particular, a photoresist based mask method is introduced for glass etching which can strongly resist against etchant attacks up to 2 hours, showing high adhesion properties on glass substrate for fabrication of microfluidic microchannels. The width of the channels is determined by the width of the lines in photo-mask design and the rate of glass isotropic etching. The channel width range about 30µm to 350µm is fabricated. Commercially available inexpensive microscopic glass slides have been used as substrate. Achieving smooth and clear surface after wet etching process is an important factor for easily flowing fluid through channels and monitoring purposes. It is achieved by implementing special etchant with adding HCL in diluted BOE solution to get smooth and clear surface. The etch rate of the glass strongly depends on the concentration of the etchant. A mixture of different solutions with special ratios has been applied. Finally, typical UV curable glue is utilized for glass-glass bonding. [ABSTRACT FROM AUTHOR]
Abstract (Lithuanian): Pateiktas nebrangus mikrohidrodinaminių įtaisų stiklo pagrindu ėsdinimo metodas. 150 µm gylio mikrokanalai buvo gauti implementuojant fotorezistą ir drėgną ėsdinimo procesą. Fotorezistas naudojamas kaip kaukė stiklui ėsdinti. Jis gali būti atsparus ėsdiklui daugiau nei 2 val. ir išlaiko geras adhezijos savybes gaminant mikrohidrodinaminius kanalus. Kanalų plotis priklauso nuo fotokaukės linijų pločio ir stiklo izotropinio ėsdinimo santykio. Gautas kanalo plotis -- nuo 30 µm iki 350 µm. Lygus ir švarus paviršius po drėgno ėsdinimo yra svarbus veiksnys užtikrinant sklandų skysčių tekėjimą mikrokanalais. Tai pasiekta naudojant specialų ėsdiklį ir pridedant HCL į atskiestą BOE tirpalą. Buvo naudojami įvairių sudėčių tirpalai. [ABSTRACT FROM AUTHOR]
Copyright of Electronics & Electrical Engineering is the property of Electronics & Electrical Engineering and its content may not be copied or emailed to multiple sites without the copyright holder's express written permission. Additionally, content may not be used with any artificial intelligence tools or machine learning technologies. However, users may print, download, or email articles for individual use. This abstract may be abridged. No warranty is given about the accuracy of the copy. Users should refer to the original published version of the material for the full abstract. (Copyright applies to all Abstracts.)
Database: Engineering Source
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Header DbId: egs
DbLabel: Engineering Source
An: 69886655
AccessLevel: 6
PubType: Academic Journal
PubTypeId: academicJournal
PreciseRelevancyScore: 0
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Items – Name: Title
  Label: Title
  Group: Ti
  Data: Fabrication of Glass-based Microfluidic Devices with Photoresist as Mask.
– Name: TitleAlt
  Label: Alternate Title
  Group: TiAlt
  Data: Mikrohidrodinaminių įtaisų stiklo pagrindu su fotorezistu, kuris naudojamas kaip kaukė, gamyba.
– Name: Author
  Label: Authors
  Group: Au
  Data: <searchLink fieldCode="AR" term="%22Bahadorimehr%2C+A%2E%22">Bahadorimehr, A.</searchLink><relatesTo>1</relatesTo><i> bahadorimehr@gmail.com</i><br /><searchLink fieldCode="AR" term="%22Majlis%2C+B%2E+Y%2E%22">Majlis, B. Y.</searchLink><relatesTo>1</relatesTo><i> burhan@ukm.my</i>
– Name: TitleSource
  Label: Source
  Group: Src
  Data: <searchLink fieldCode="JN" term="%22Electronics+%26+Electrical+Engineering%22">Electronics & Electrical Engineering</searchLink>. 2011, Issue 116, p45-48. 4p.
– Name: Subject
  Label: Subjects
  Group: Su
  Data: <searchLink fieldCode="DE" term="%22Glass+etching%22">Glass etching</searchLink><br /><searchLink fieldCode="DE" term="%22Microfabrication%22">Microfabrication</searchLink><br /><searchLink fieldCode="DE" term="%22Microfluidic+devices%22">Microfluidic devices</searchLink><br /><searchLink fieldCode="DE" term="%22Photoresists%22">Photoresists</searchLink><br /><searchLink fieldCode="DE" term="%22Masks+%28Electronics%29%22">Masks (Electronics)</searchLink><br /><searchLink fieldCode="DE" term="%22Ultraviolet+radiation%22">Ultraviolet radiation</searchLink>
– Name: Abstract
  Label: Abstract (English)
  Group: Ab
  Data: This paper presents a low cost method for etching of glass based microfluidic devices. Microchannels with the depth up to 150 µm were achieved by implementing a photoresist and wet etching process. In particular, a photoresist based mask method is introduced for glass etching which can strongly resist against etchant attacks up to 2 hours, showing high adhesion properties on glass substrate for fabrication of microfluidic microchannels. The width of the channels is determined by the width of the lines in photo-mask design and the rate of glass isotropic etching. The channel width range about 30µm to 350µm is fabricated. Commercially available inexpensive microscopic glass slides have been used as substrate. Achieving smooth and clear surface after wet etching process is an important factor for easily flowing fluid through channels and monitoring purposes. It is achieved by implementing special etchant with adding HCL in diluted BOE solution to get smooth and clear surface. The etch rate of the glass strongly depends on the concentration of the etchant. A mixture of different solutions with special ratios has been applied. Finally, typical UV curable glue is utilized for glass-glass bonding. [ABSTRACT FROM AUTHOR]
– Name: Abstract
  Label: Abstract (Lithuanian)
  Group: Ab
  Data: Pateiktas nebrangus mikrohidrodinaminių įtaisų stiklo pagrindu ėsdinimo metodas. 150 µm gylio mikrokanalai buvo gauti implementuojant fotorezistą ir drėgną ėsdinimo procesą. Fotorezistas naudojamas kaip kaukė stiklui ėsdinti. Jis gali būti atsparus ėsdiklui daugiau nei 2 val. ir išlaiko geras adhezijos savybes gaminant mikrohidrodinaminius kanalus. Kanalų plotis priklauso nuo fotokaukės linijų pločio ir stiklo izotropinio ėsdinimo santykio. Gautas kanalo plotis -- nuo 30 µm iki 350 µm. Lygus ir švarus paviršius po drėgno ėsdinimo yra svarbus veiksnys užtikrinant sklandų skysčių tekėjimą mikrokanalais. Tai pasiekta naudojant specialų ėsdiklį ir pridedant HCL į atskiestą BOE tirpalą. Buvo naudojami įvairių sudėčių tirpalai. [ABSTRACT FROM AUTHOR]
– Name: AbstractSuppliedCopyright
  Label:
  Group: Ab
  Data: <i>Copyright of Electronics & Electrical Engineering is the property of Electronics & Electrical Engineering and its content may not be copied or emailed to multiple sites without the copyright holder's express written permission. Additionally, content may not be used with any artificial intelligence tools or machine learning technologies. However, users may print, download, or email articles for individual use. This abstract may be abridged. No warranty is given about the accuracy of the copy. Users should refer to the original published version of the material for the full abstract.</i> (Copyright applies to all Abstracts.)
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RecordInfo BibRecord:
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    Identifiers:
      – Type: doi
        Value: 10.5755/j01.eee.116.10.878
    Languages:
      – Code: eng
        Text: English
    PhysicalDescription:
      Pagination:
        PageCount: 4
        StartPage: 45
    Subjects:
      – SubjectFull: Glass etching
        Type: general
      – SubjectFull: Microfabrication
        Type: general
      – SubjectFull: Microfluidic devices
        Type: general
      – SubjectFull: Photoresists
        Type: general
      – SubjectFull: Masks (Electronics)
        Type: general
      – SubjectFull: Ultraviolet radiation
        Type: general
    Titles:
      – TitleFull: Fabrication of Glass-based Microfluidic Devices with Photoresist as Mask.
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          Name:
            NameFull: Bahadorimehr, A.
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            NameFull: Majlis, B. Y.
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          Dates:
            – D: 01
              M: 12
              Text: 2011
              Type: published
              Y: 2011
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              Value: 13921215
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              Value: 116
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            – TitleFull: Electronics & Electrical Engineering
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