Bibliographic Details
| Title: |
Wafer scale submicron optical grating for the picometre measurement of aberrations and stitching errors in step and repeat cameras |
| Authors: |
Jourlin, Y., Jay, J., Pigeon, F., Bouchet, G., Parriaux, O. parriaux@univ-st-etienne.fr, van Dijk, P., Pellens, R., Topçu, S., Alayli, Y., Bonis, M. |
| Source: |
Microelectronic Engineering. Jul2002, Vol. 61/62, p1101. 6p. |
| Subjects: |
Diffraction gratings, Optics |
| Abstract: |
A high-resolution diffractive measurement technique reveals that a wafer scale grating fabricated by an ASML PAS 5500 step and repeat camera exhibits a stitching error less than 10 nm and a variation of a nominally constant period of 1 μm of less than 20 pm. [Copyright &y& Elsevier] |
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| Database: |
Engineering Source |
