APA (7th ed.) Citation

Jourlin, Y., Jay, J., Pigeon, F., Bouchet, G., Parriaux, O., van Dijk, P., . . . Bonis, M. (2002). Wafer scale submicron optical grating for the picometre measurement of aberrations and stitching errors in step and repeat cameras. Microelectronic Engineering, 61/62, 1101. https://doi.org/10.1016/S0167-9317(02)00472-0

Chicago Style (17th ed.) Citation

Jourlin, Y., et al. "Wafer Scale Submicron Optical Grating for the Picometre Measurement of Aberrations and Stitching Errors in Step and Repeat Cameras." Microelectronic Engineering 61/62 (2002): 1101. https://doi.org/10.1016/S0167-9317(02)00472-0.

MLA (9th ed.) Citation

Jourlin, Y., et al. "Wafer Scale Submicron Optical Grating for the Picometre Measurement of Aberrations and Stitching Errors in Step and Repeat Cameras." Microelectronic Engineering, vol. 61/62, 2002, p. 1101, https://doi.org/10.1016/S0167-9317(02)00472-0.