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Wafer scale submicron optical grating for the picometre measurement of aberrations and stitching errors in step and repeat cameras

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Title: Wafer scale submicron optical grating for the picometre measurement of aberrations and stitching errors in step and repeat cameras
Authors: Jourlin, Y., Jay, J., Pigeon, F., Bouchet, G., Parriaux, O. parriaux@univ-st-etienne.fr, van Dijk, P., Pellens, R., Topçu, S., Alayli, Y., Bonis, M.
Source: Microelectronic Engineering. Jul2002, Vol. 61/62, p1101. 6p.
Subjects: Diffraction gratings, Optics
Abstract: A high-resolution diffractive measurement technique reveals that a wafer scale grating fabricated by an ASML PAS 5500 step and repeat camera exhibits a stitching error less than 10 nm and a variation of a nominally constant period of 1 μm of less than 20 pm. [Copyright &y& Elsevier]
Copyright of Microelectronic Engineering is the property of Elsevier B.V. and its content may not be copied or emailed to multiple sites without the copyright holder's express written permission. Additionally, content may not be used with any artificial intelligence tools or machine learning technologies. However, users may print, download, or email articles for individual use. This abstract may be abridged. No warranty is given about the accuracy of the copy. Users should refer to the original published version of the material for the full abstract. (Copyright applies to all Abstracts.)
Database: Engineering Source
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DbLabel: Engineering Source
An: 7817777
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PubType: Academic Journal
PubTypeId: academicJournal
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  Data: Wafer scale submicron optical grating for the picometre measurement of aberrations and stitching errors in step and repeat cameras
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  Data: <searchLink fieldCode="AR" term="%22Jourlin%2C+Y%2E%22">Jourlin, Y.</searchLink><br /><searchLink fieldCode="AR" term="%22Jay%2C+J%2E%22">Jay, J.</searchLink><br /><searchLink fieldCode="AR" term="%22Pigeon%2C+F%2E%22">Pigeon, F.</searchLink><br /><searchLink fieldCode="AR" term="%22Bouchet%2C+G%2E%22">Bouchet, G.</searchLink><br /><searchLink fieldCode="AR" term="%22Parriaux%2C+O%2E%22">Parriaux, O.</searchLink><i> parriaux@univ-st-etienne.fr</i><br /><searchLink fieldCode="AR" term="%22van+Dijk%2C+P%2E%22">van Dijk, P.</searchLink><br /><searchLink fieldCode="AR" term="%22Pellens%2C+R%2E%22">Pellens, R.</searchLink><br /><searchLink fieldCode="AR" term="%22Topçu%2C+S%2E%22">Topçu, S.</searchLink><br /><searchLink fieldCode="AR" term="%22Alayli%2C+Y%2E%22">Alayli, Y.</searchLink><br /><searchLink fieldCode="AR" term="%22Bonis%2C+M%2E%22">Bonis, M.</searchLink>
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  Data: <searchLink fieldCode="JN" term="%22Microelectronic+Engineering%22">Microelectronic Engineering</searchLink>. Jul2002, Vol. 61/62, p1101. 6p.
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  Data: <searchLink fieldCode="DE" term="%22Diffraction+gratings%22">Diffraction gratings</searchLink><br /><searchLink fieldCode="DE" term="%22Optics%22">Optics</searchLink>
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  Data: A high-resolution diffractive measurement technique reveals that a wafer scale grating fabricated by an ASML PAS 5500 step and repeat camera exhibits a stitching error less than 10 nm and a variation of a nominally constant period of 1 μm of less than 20 pm. [Copyright &y& Elsevier]
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  Data: <i>Copyright of Microelectronic Engineering is the property of Elsevier B.V. and its content may not be copied or emailed to multiple sites without the copyright holder's express written permission. Additionally, content may not be used with any artificial intelligence tools or machine learning technologies. However, users may print, download, or email articles for individual use. This abstract may be abridged. No warranty is given about the accuracy of the copy. Users should refer to the original published version of the material for the full abstract.</i> (Copyright applies to all Abstracts.)
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        Text: English
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              Text: Jul2002
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