Bibliographic Details
| Title: |
In situ spectroscopic ellipsometry study of TiO2 films deposited by plasma enhanced chemical vapour deposition. |
| Authors: |
Li, D.1, Carette, M.1, Granier, A.1, Landesman, J.P.1, Goullet, A.1 antoine.goullet@univ-nantes.fr |
| Source: |
Applied Surface Science. Oct2013, Vol. 283, p234-239. 6p. |
| Subjects: |
Ellipsometry, Titanium dioxide films, Plasma-enhanced chemical vapor deposition, Crystal growth, Surface morphology, Scanning electron microscopy |
| Abstract: |
Highlights: [•] Spectroscopic ellipsometry study of TiO2 film deposited by PECVD. [•] Impact of growth interruptions on the film optical and morphological properties. [•] Influence of the applied bias voltage on the film properties. [•] Good agreement between ellipsometric analysis and SEM observation. [Copyright &y& Elsevier] |
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| Database: |
Engineering Source |
