Li, D., Carette, M., Granier, A., Landesman, J., & Goullet, A. (2013). In situ spectroscopic ellipsometry study of TiO2 films deposited by plasma enhanced chemical vapour deposition. Applied Surface Science, 283, 234. https://doi.org/10.1016/j.apsusc.2013.06.091
Chicago Style (17th ed.) CitationLi, D., M. Carette, A. Granier, J.P Landesman, and A. Goullet. "In Situ Spectroscopic Ellipsometry Study of TiO2 Films Deposited by Plasma Enhanced Chemical Vapour Deposition." Applied Surface Science 283 (2013): 234. https://doi.org/10.1016/j.apsusc.2013.06.091.
MLA (9th ed.) CitationLi, D., et al. "In Situ Spectroscopic Ellipsometry Study of TiO2 Films Deposited by Plasma Enhanced Chemical Vapour Deposition." Applied Surface Science, vol. 283, 2013, p. 234, https://doi.org/10.1016/j.apsusc.2013.06.091.