In situ spectroscopic ellipsometry study of TiO2 films deposited by plasma enhanced chemical vapour deposition.
Saved in:
| Title: | In situ spectroscopic ellipsometry study of TiO |
|---|---|
| Authors: | Li, D.1, Carette, M.1, Granier, A.1, Landesman, J.P.1, Goullet, A.1 antoine.goullet@univ-nantes.fr |
| Source: | Applied Surface Science. Oct2013, Vol. 283, p234-239. 6p. |
| Subjects: | Ellipsometry, Titanium dioxide films, Plasma-enhanced chemical vapor deposition, Crystal growth, Surface morphology, Scanning electron microscopy |
| Abstract: | Highlights: [•] Spectroscopic ellipsometry study of TiO2 film deposited by PECVD. [•] Impact of growth interruptions on the film optical and morphological properties. [•] Influence of the applied bias voltage on the film properties. [•] Good agreement between ellipsometric analysis and SEM observation. [Copyright &y& Elsevier] |
| Copyright of Applied Surface Science is the property of Elsevier B.V. and its content may not be copied or emailed to multiple sites without the copyright holder's express written permission. Additionally, content may not be used with any artificial intelligence tools or machine learning technologies. However, users may print, download, or email articles for individual use. This abstract may be abridged. No warranty is given about the accuracy of the copy. Users should refer to the original published version of the material for the full abstract. (Copyright applies to all Abstracts.) | |
| Database: | Engineering Source |
| FullText | Text: Availability: 0 |
|---|---|
| Header | DbId: egs DbLabel: Engineering Source An: 90005881 AccessLevel: 6 PubType: Academic Journal PubTypeId: academicJournal PreciseRelevancyScore: 0 |
| IllustrationInfo | |
| Items | – Name: Title Label: Title Group: Ti Data: In situ spectroscopic ellipsometry study of TiO<subscript>2</subscript> films deposited by plasma enhanced chemical vapour deposition. – Name: Author Label: Authors Group: Au Data: <searchLink fieldCode="AR" term="%22Li%2C+D%2E%22">Li, D.</searchLink><relatesTo>1</relatesTo><br /><searchLink fieldCode="AR" term="%22Carette%2C+M%2E%22">Carette, M.</searchLink><relatesTo>1</relatesTo><br /><searchLink fieldCode="AR" term="%22Granier%2C+A%2E%22">Granier, A.</searchLink><relatesTo>1</relatesTo><br /><searchLink fieldCode="AR" term="%22Landesman%2C+J%2EP%2E%22">Landesman, J.P.</searchLink><relatesTo>1</relatesTo><br /><searchLink fieldCode="AR" term="%22Goullet%2C+A%2E%22">Goullet, A.</searchLink><relatesTo>1</relatesTo><i> antoine.goullet@univ-nantes.fr</i> – Name: TitleSource Label: Source Group: Src Data: <searchLink fieldCode="JN" term="%22Applied+Surface+Science%22">Applied Surface Science</searchLink>. Oct2013, Vol. 283, p234-239. 6p. – Name: Subject Label: Subjects Group: Su Data: <searchLink fieldCode="DE" term="%22Ellipsometry%22">Ellipsometry</searchLink><br /><searchLink fieldCode="DE" term="%22Titanium+dioxide+films%22">Titanium dioxide films</searchLink><br /><searchLink fieldCode="DE" term="%22Plasma-enhanced+chemical+vapor+deposition%22">Plasma-enhanced chemical vapor deposition</searchLink><br /><searchLink fieldCode="DE" term="%22Crystal+growth%22">Crystal growth</searchLink><br /><searchLink fieldCode="DE" term="%22Surface+morphology%22">Surface morphology</searchLink><br /><searchLink fieldCode="DE" term="%22Scanning+electron+microscopy%22">Scanning electron microscopy</searchLink> – Name: Abstract Label: Abstract Group: Ab Data: Highlights: [•] Spectroscopic ellipsometry study of TiO2 film deposited by PECVD. [•] Impact of growth interruptions on the film optical and morphological properties. [•] Influence of the applied bias voltage on the film properties. [•] Good agreement between ellipsometric analysis and SEM observation. [Copyright &y& Elsevier] – Name: AbstractSuppliedCopyright Label: Group: Ab Data: <i>Copyright of Applied Surface Science is the property of Elsevier B.V. and its content may not be copied or emailed to multiple sites without the copyright holder's express written permission. Additionally, content may not be used with any artificial intelligence tools or machine learning technologies. However, users may print, download, or email articles for individual use. This abstract may be abridged. No warranty is given about the accuracy of the copy. Users should refer to the original published version of the material for the full abstract.</i> (Copyright applies to all Abstracts.) |
| PLink | https://search.ebscohost.com/login.aspx?direct=true&site=eds-live&db=egs&AN=90005881 |
| RecordInfo | BibRecord: BibEntity: Identifiers: – Type: doi Value: 10.1016/j.apsusc.2013.06.091 Languages: – Code: eng Text: English PhysicalDescription: Pagination: PageCount: 6 StartPage: 234 Subjects: – SubjectFull: Ellipsometry Type: general – SubjectFull: Titanium dioxide films Type: general – SubjectFull: Plasma-enhanced chemical vapor deposition Type: general – SubjectFull: Crystal growth Type: general – SubjectFull: Surface morphology Type: general – SubjectFull: Scanning electron microscopy Type: general Titles: – TitleFull: In situ spectroscopic ellipsometry study of TiO2 films deposited by plasma enhanced chemical vapour deposition. Type: main BibRelationships: HasContributorRelationships: – PersonEntity: Name: NameFull: Li, D. – PersonEntity: Name: NameFull: Carette, M. – PersonEntity: Name: NameFull: Granier, A. – PersonEntity: Name: NameFull: Landesman, J.P. – PersonEntity: Name: NameFull: Goullet, A. IsPartOfRelationships: – BibEntity: Dates: – D: 15 M: 10 Text: Oct2013 Type: published Y: 2013 Identifiers: – Type: issn-print Value: 01694332 Numbering: – Type: volume Value: 283 Titles: – TitleFull: Applied Surface Science Type: main |
| ResultId | 1 |
