View in EDS

UV-induced modification of fluorocarbon for improvement of subsequent wet removal.

Saved in:
Bibliographic Details
Title: UV-induced modification of fluorocarbon for improvement of subsequent wet removal.
Authors: Le, Q.T.1 QuocToan.Le@imec.be, Simms, I.2, Yue, H.2, Brown, I.2, Kesters, E.1, Vereecke, G.1, Struyf, H.1, De Gendt, S.1,3
Source: Microelectronic Engineering. Feb2014, Vol. 114, p136-140. 5p.
Subjects: Ultraviolet radiation, Fluorocarbons, Atmospheric research, Radiation exposure, Carbon compounds, Chemical processes
Abstract: Highlights: [•] We studied the effect of UV exposure parameters on a model CFx polymer. [•] A partial removal of CFx (x =1–3) and CF CF2 groups occurred during the UV irradiation in oxygen. [•] The extent of the polymer modification during UV exposure determined the removal efficiency in the subsequent wet clean. [•] The UV dose and the atmosphere in which the UV pre-treatment is carried out represent the most critical parameters. [•] Good compatibility of the UV process with a 2.0 low-k material (Δk ⩽0.1), except for PO2 >100Torr at high dose. [Copyright &y& Elsevier]
Copyright of Microelectronic Engineering is the property of Elsevier B.V. and its content may not be copied or emailed to multiple sites without the copyright holder's express written permission. Additionally, content may not be used with any artificial intelligence tools or machine learning technologies. However, users may print, download, or email articles for individual use. This abstract may be abridged. No warranty is given about the accuracy of the copy. Users should refer to the original published version of the material for the full abstract. (Copyright applies to all Abstracts.)
Database: Engineering Source
FullText Text:
  Availability: 0
Header DbId: egs
DbLabel: Engineering Source
An: 92650684
AccessLevel: 6
PubType: Academic Journal
PubTypeId: academicJournal
PreciseRelevancyScore: 0
IllustrationInfo
Items – Name: Title
  Label: Title
  Group: Ti
  Data: UV-induced modification of fluorocarbon for improvement of subsequent wet removal.
– Name: Author
  Label: Authors
  Group: Au
  Data: <searchLink fieldCode="AR" term="%22Le%2C+Q%2ET%2E%22">Le, Q.T.</searchLink><relatesTo>1</relatesTo><i> QuocToan.Le@imec.be</i><br /><searchLink fieldCode="AR" term="%22Simms%2C+I%2E%22">Simms, I.</searchLink><relatesTo>2</relatesTo><br /><searchLink fieldCode="AR" term="%22Yue%2C+H%2E%22">Yue, H.</searchLink><relatesTo>2</relatesTo><br /><searchLink fieldCode="AR" term="%22Brown%2C+I%2E%22">Brown, I.</searchLink><relatesTo>2</relatesTo><br /><searchLink fieldCode="AR" term="%22Kesters%2C+E%2E%22">Kesters, E.</searchLink><relatesTo>1</relatesTo><br /><searchLink fieldCode="AR" term="%22Vereecke%2C+G%2E%22">Vereecke, G.</searchLink><relatesTo>1</relatesTo><br /><searchLink fieldCode="AR" term="%22Struyf%2C+H%2E%22">Struyf, H.</searchLink><relatesTo>1</relatesTo><br /><searchLink fieldCode="AR" term="%22De+Gendt%2C+S%2E%22">De Gendt, S.</searchLink><relatesTo>1,3</relatesTo>
– Name: TitleSource
  Label: Source
  Group: Src
  Data: <searchLink fieldCode="JN" term="%22Microelectronic+Engineering%22">Microelectronic Engineering</searchLink>. Feb2014, Vol. 114, p136-140. 5p.
– Name: Subject
  Label: Subjects
  Group: Su
  Data: <searchLink fieldCode="DE" term="%22Ultraviolet+radiation%22">Ultraviolet radiation</searchLink><br /><searchLink fieldCode="DE" term="%22Fluorocarbons%22">Fluorocarbons</searchLink><br /><searchLink fieldCode="DE" term="%22Atmospheric+research%22">Atmospheric research</searchLink><br /><searchLink fieldCode="DE" term="%22Radiation+exposure%22">Radiation exposure</searchLink><br /><searchLink fieldCode="DE" term="%22Carbon+compounds%22">Carbon compounds</searchLink><br /><searchLink fieldCode="DE" term="%22Chemical+processes%22">Chemical processes</searchLink>
– Name: Abstract
  Label: Abstract
  Group: Ab
  Data: Highlights: [•] We studied the effect of UV exposure parameters on a model CFx polymer. [•] A partial removal of CFx (x =1–3) and CF CF2 groups occurred during the UV irradiation in oxygen. [•] The extent of the polymer modification during UV exposure determined the removal efficiency in the subsequent wet clean. [•] The UV dose and the atmosphere in which the UV pre-treatment is carried out represent the most critical parameters. [•] Good compatibility of the UV process with a 2.0 low-k material (Δk ⩽0.1), except for PO2 >100Torr at high dose. [Copyright &y& Elsevier]
– Name: AbstractSuppliedCopyright
  Label:
  Group: Ab
  Data: <i>Copyright of Microelectronic Engineering is the property of Elsevier B.V. and its content may not be copied or emailed to multiple sites without the copyright holder's express written permission. Additionally, content may not be used with any artificial intelligence tools or machine learning technologies. However, users may print, download, or email articles for individual use. This abstract may be abridged. No warranty is given about the accuracy of the copy. Users should refer to the original published version of the material for the full abstract.</i> (Copyright applies to all Abstracts.)
PLink https://search.ebscohost.com/login.aspx?direct=true&site=eds-live&db=egs&AN=92650684
RecordInfo BibRecord:
  BibEntity:
    Identifiers:
      – Type: doi
        Value: 10.1016/j.mee.2013.03.112
    Languages:
      – Code: eng
        Text: English
    PhysicalDescription:
      Pagination:
        PageCount: 5
        StartPage: 136
    Subjects:
      – SubjectFull: Ultraviolet radiation
        Type: general
      – SubjectFull: Fluorocarbons
        Type: general
      – SubjectFull: Atmospheric research
        Type: general
      – SubjectFull: Radiation exposure
        Type: general
      – SubjectFull: Carbon compounds
        Type: general
      – SubjectFull: Chemical processes
        Type: general
    Titles:
      – TitleFull: UV-induced modification of fluorocarbon for improvement of subsequent wet removal.
        Type: main
  BibRelationships:
    HasContributorRelationships:
      – PersonEntity:
          Name:
            NameFull: Le, Q.T.
      – PersonEntity:
          Name:
            NameFull: Simms, I.
      – PersonEntity:
          Name:
            NameFull: Yue, H.
      – PersonEntity:
          Name:
            NameFull: Brown, I.
      – PersonEntity:
          Name:
            NameFull: Kesters, E.
      – PersonEntity:
          Name:
            NameFull: Vereecke, G.
      – PersonEntity:
          Name:
            NameFull: Struyf, H.
      – PersonEntity:
          Name:
            NameFull: De Gendt, S.
    IsPartOfRelationships:
      – BibEntity:
          Dates:
            – D: 01
              M: 02
              Text: Feb2014
              Type: published
              Y: 2014
          Identifiers:
            – Type: issn-print
              Value: 01679317
          Numbering:
            – Type: volume
              Value: 114
          Titles:
            – TitleFull: Microelectronic Engineering
              Type: main
ResultId 1