An Ultra‐Low‐Power and High‐Temperature‐Homogeneity Wafer‐Scale Infrared Source.
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| Title: | An Ultra‐Low‐Power and High‐Temperature‐Homogeneity Wafer‐Scale Infrared Source. |
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| Authors: | Zhang, Qirui1,2 (AUTHOR), Chen, Shuxin3 (AUTHOR), Shi, Meng1,2 (AUTHOR), Liu, Xin1,2 (AUTHOR), Li, Hanhui1,2 (AUTHOR), Tao, Ruitao4 (AUTHOR), Liu, Yu1,2 (AUTHOR), Zhou, Na1,2 (AUTHOR) zhouna@ime.ac.cn, Li, Wenwu3 (AUTHOR) liwenwu@fudan.edu.cn, Mao, Haiyang1,2,5 (AUTHOR) maohaiyang@ime.ac.cn |
| Source: | Energy & Environmental Materials. Jul2026, Vol. 9 Issue 4, p1-9. 9p. |
| Database: | Environment Complete |
| ISSN: | 25750348 |
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| DOI: | 10.1002/eem2.70208 |