MoO3 Doping Effects on the Performance of CuO High-Temperature Current Rectifiers.
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| Title: | MoO |
|---|---|
| Authors: | Zanoon, Tareq1 (AUTHOR), Qasrawi, A. F.2,3 (AUTHOR) atef.qasrawi@aaup.edu, Alawneh, Isam4 (AUTHOR), Khanfar, Hazem K.1 (AUTHOR) |
| Source: | Arabian Journal for Science & Engineering (Springer Science & Business Media B.V. ). Sep2026, Vol. 51 Issue 17, p20479-20491. 13p. |
| Subject Terms: | *Electric current rectifiers, *Copper oxide films, *Thermionic emission, *X-ray powder diffraction, *Molybdenum oxides, *Semiconductor junctions, *Vapor-plating |
| Abstract: | Herein, CuO thin films were thermally evaporated onto n-Si and doped with MoO3 (MCO-xx, where xx denotes the dopant wt.%). XRD confirmed a monoclinic CuO phase for all films, while MoO3 incorporation strongly modified the microstructure: 0.5 wt.% produced a marked increase in crystallite size with a substantial reduction in microstrain, stacking faults, and line-defect density, whereas higher dopant levels partially reintroduced lattice distortion. The resulting n-Si/p-CuO rectifiers exhibited high, bias-dependent rectification ratios, reaching 109 and 5600 at 1.5 and 5.0 V for the undoped device, respectively, and increasing by about fourfold at 1.5 V for 1.5 wt.% doping. Current–voltage characteristics measured over 298–373 K revealed a progressive reduction of rectification with temperature while preserving rectifying behavior up to 373 K. Transport analysis indicates that thermionic emission and thermally assisted tunneling govern conduction at room temperature; MoO3 doping lowers the effective barrier height and reduces the tunneling width, whereas increasing temperature increases the extracted barrier height. These findings demonstrate that MoO3-modified CuO/Si interfaces can deliver low-voltage rectification with sustained operation at elevated temperature. [ABSTRACT FROM AUTHOR] |
| Database: | Energy & Power Source |
| FullText | Text: Availability: 0 |
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| Header | DbId: enr DbLabel: Energy & Power Source An: 197188673 AccessLevel: 6 PubType: Academic Journal PubTypeId: academicJournal PreciseRelevancyScore: 0 |
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| Items | – Name: Title Label: Title Group: Ti Data: MoO<subscript>3</subscript> Doping Effects on the Performance of CuO High-Temperature Current Rectifiers. – Name: Author Label: Authors Group: Au Data: <searchLink fieldCode="AR" term="%22Zanoon%2C+Tareq%22">Zanoon, Tareq</searchLink><relatesTo>1</relatesTo> (AUTHOR)<br /><searchLink fieldCode="AR" term="%22Qasrawi%2C+A%2E+F%2E%22">Qasrawi, A. F.</searchLink><relatesTo>2,3</relatesTo> (AUTHOR)<i> atef.qasrawi@aaup.edu</i><br /><searchLink fieldCode="AR" term="%22Alawneh%2C+Isam%22">Alawneh, Isam</searchLink><relatesTo>4</relatesTo> (AUTHOR)<br /><searchLink fieldCode="AR" term="%22Khanfar%2C+Hazem+K%2E%22">Khanfar, Hazem K.</searchLink><relatesTo>1</relatesTo> (AUTHOR) – Name: TitleSource Label: Source Group: Src Data: <searchLink fieldCode="JN" term="%22Arabian+Journal+for+Science+%26+Engineering+%28Springer+Science+%26+Business+Media+B%2EV%2E+%29%22">Arabian Journal for Science & Engineering (Springer Science & Business Media B.V. )</searchLink>. Sep2026, Vol. 51 Issue 17, p20479-20491. 13p. – Name: Subject Label: Subject Terms Group: Su Data: *<searchLink fieldCode="DE" term="%22Electric+current+rectifiers%22">Electric current rectifiers</searchLink><br />*<searchLink fieldCode="DE" term="%22Copper+oxide+films%22">Copper oxide films</searchLink><br />*<searchLink fieldCode="DE" term="%22Thermionic+emission%22">Thermionic emission</searchLink><br />*<searchLink fieldCode="DE" term="%22X-ray+powder+diffraction%22">X-ray powder diffraction</searchLink><br />*<searchLink fieldCode="DE" term="%22Molybdenum+oxides%22">Molybdenum oxides</searchLink><br />*<searchLink fieldCode="DE" term="%22Semiconductor+junctions%22">Semiconductor junctions</searchLink><br />*<searchLink fieldCode="DE" term="%22Vapor-plating%22">Vapor-plating</searchLink> – Name: Abstract Label: Abstract Group: Ab Data: Herein, CuO thin films were thermally evaporated onto n-Si and doped with MoO3 (MCO-xx, where xx denotes the dopant wt.%). XRD confirmed a monoclinic CuO phase for all films, while MoO3 incorporation strongly modified the microstructure: 0.5 wt.% produced a marked increase in crystallite size with a substantial reduction in microstrain, stacking faults, and line-defect density, whereas higher dopant levels partially reintroduced lattice distortion. The resulting n-Si/p-CuO rectifiers exhibited high, bias-dependent rectification ratios, reaching 109 and 5600 at 1.5 and 5.0 V for the undoped device, respectively, and increasing by about fourfold at 1.5 V for 1.5 wt.% doping. Current–voltage characteristics measured over 298–373 K revealed a progressive reduction of rectification with temperature while preserving rectifying behavior up to 373 K. Transport analysis indicates that thermionic emission and thermally assisted tunneling govern conduction at room temperature; MoO3 doping lowers the effective barrier height and reduces the tunneling width, whereas increasing temperature increases the extracted barrier height. These findings demonstrate that MoO3-modified CuO/Si interfaces can deliver low-voltage rectification with sustained operation at elevated temperature. [ABSTRACT FROM AUTHOR] |
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| RecordInfo | BibRecord: BibEntity: Identifiers: – Type: doi Value: 10.1007/s13369-026-11197-y Languages: – Code: eng Text: English PhysicalDescription: Pagination: PageCount: 13 StartPage: 20479 Subjects: – SubjectFull: Electric current rectifiers Type: general – SubjectFull: Copper oxide films Type: general – SubjectFull: Thermionic emission Type: general – SubjectFull: X-ray powder diffraction Type: general – SubjectFull: Molybdenum oxides Type: general – SubjectFull: Semiconductor junctions Type: general – SubjectFull: Vapor-plating Type: general Titles: – TitleFull: MoO3 Doping Effects on the Performance of CuO High-Temperature Current Rectifiers. Type: main BibRelationships: HasContributorRelationships: – PersonEntity: Name: NameFull: Zanoon, Tareq – PersonEntity: Name: NameFull: Qasrawi, A. F. – PersonEntity: Name: NameFull: Alawneh, Isam – PersonEntity: Name: NameFull: Khanfar, Hazem K. IsPartOfRelationships: – BibEntity: Dates: – D: 01 M: 09 Text: Sep2026 Type: published Y: 2026 Identifiers: – Type: issn-print Value: 2193567X Numbering: – Type: volume Value: 51 – Type: issue Value: 17 Titles: – TitleFull: Arabian Journal for Science & Engineering (Springer Science & Business Media B.V. ) Type: main |
| ResultId | 1 |