USE OF A CONVOLUTION METHOD AT LINEAR INTERVALS IN X-RAY DIFFRACTION PROFILES.

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Bibliographic Details
Title: USE OF A CONVOLUTION METHOD AT LINEAR INTERVALS IN X-RAY DIFFRACTION PROFILES.
Alternate Title: EMPLEO DE MEÍTODO DE CONVOLUCIOÍN A INTERVALOS LINEALES EN PERFILES DE DIFRACCIOÍN DE RAYOS-X.
Authors: RODRÍGUEZ-HERRERA, D. M.1, PENTON-MADRIGAI, A.2 arbelio@fisica.uh.cu, ESTEVEZ-RAMS, E.2
Source: Revista Cubana de Física. 7/15/2024, Vol. 41 Issue 1, p16-21. 6p.
Subjects: CRYSTAL structure, DIFFRACTION patterns, SET functions, X-ray diffraction
Abstract (English): A mathematical formalism for calculating the intrinsic profile of a diffraction maximum through a convolution process using a set of linear functions by intervals is presented. This convolution process is implemented in the formalism for the direct solution of a diffraction pattern of a layered crystalline structure affected by planar defects. It allows the correlation length (AC) to be calculated, which describes the degree of disorder in this type of crystalline structure. The obtained result is validated through the Warren-Averbach method for microstructural analysis. [ABSTRACT FROM AUTHOR]
Abstract (Spanish): Se presenta un formalismo matemaÍ tico para el caÍ lculo del perfil intrínseco de un máximo de difracción a través de un proceso de convolucioÍ n usando un conjunto de funciones lineales por intervalos. Este proceso de convolucioí n es implementado en el formalismo para la solucioí n directa de un patroí n de difraccioín de una estructura cristalina de capas afectada por defectos planares. Este procedimiento permite calcular la longitud de correlacion (AC), cantidad que describe el grado de desorden en este tipo de estructuras cristalinas. El resultado obtenido es validado a traveís del metodo de Warren - Averbach para el analisis microestructural. [ABSTRACT FROM AUTHOR]
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Database: MedicLatina
Description
Abstract:A mathematical formalism for calculating the intrinsic profile of a diffraction maximum through a convolution process using a set of linear functions by intervals is presented. This convolution process is implemented in the formalism for the direct solution of a diffraction pattern of a layered crystalline structure affected by planar defects. It allows the correlation length (AC) to be calculated, which describes the degree of disorder in this type of crystalline structure. The obtained result is validated through the Warren-Averbach method for microstructural analysis. [ABSTRACT FROM AUTHOR]
ISSN:02539268