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Annealing Dependence of Solution-Processed Ultra-Thin ZrOx Films for Gate Dielectric Applications.

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Bibliographic Details
Title: Annealing Dependence of Solution-Processed Ultra-Thin ZrOx Films for Gate Dielectric Applications.
Authors: Liu GX, Liu A, Meng Y, Shan FK, Shin BC, Lee WJ, Cho CR
Source: Journal of nanoscience and nanotechnology [J Nanosci Nanotechnol] 2015 Mar; Vol. 15 (3), pp. 2185-91.
Publication Type: Journal Article; Research Support, Non-U.S. Gov't
Journal Info: Publisher: American Scientific Publishers Country of Publication: United States NLM ID: 101088195 Publication Model: Print Cited Medium: Internet ISSN: 1533-4899 (Electronic) Linking ISSN: 15334880 NLM ISO Abbreviation: J Nanosci Nanotechnol Subsets: PubMed not MEDLINE
Database: MEDLINE Ultimate
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  Availability: 0
Header DbId: mdl
DbLabel: MEDLINE Ultimate
An: 26413638
AccessLevel: 2
PubType: Academic Journal
PubTypeId: academicJournal
PreciseRelevancyScore: 0
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  Data: Annealing Dependence of Solution-Processed Ultra-Thin ZrOx Films for Gate Dielectric Applications.
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  Data: <searchLink fieldCode="AU" term="%22Liu+GX%22">Liu GX</searchLink><br /><searchLink fieldCode="AU" term="%22Liu+A%22">Liu A</searchLink><br /><searchLink fieldCode="AU" term="%22Meng+Y%22">Meng Y</searchLink><br /><searchLink fieldCode="AU" term="%22Shan+FK%22">Shan FK</searchLink><br /><searchLink fieldCode="AU" term="%22Shin+BC%22">Shin BC</searchLink><br /><searchLink fieldCode="AU" term="%22Lee+WJ%22">Lee WJ</searchLink><br /><searchLink fieldCode="AU" term="%22Cho+CR%22">Cho CR</searchLink>
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  Data: <searchLink fieldCode="JN" term="%22101088195%22">Journal of nanoscience and nanotechnology</searchLink> [J Nanosci Nanotechnol] 2015 Mar; Vol. 15 (3), pp. 2185-91.
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  Data: Journal Article; Research Support, Non-U.S. Gov't
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  Data: <i>Publisher: </i><searchLink fieldCode="PB" term="%22American+Scientific+Publishers%22">American Scientific Publishers </searchLink><i>Country of Publication: </i>United States <i>NLM ID: </i>101088195 <i>Publication Model: </i>Print <i>Cited Medium: </i>Internet <i>ISSN: </i>1533-4899 (Electronic) <i>Linking ISSN: </i><searchLink fieldCode="IS" term="%2215334880%22">15334880 </searchLink><i>NLM ISO Abbreviation: </i>J Nanosci Nanotechnol <i>Subsets: </i>PubMed not MEDLINE
PLink https://search.ebscohost.com/login.aspx?direct=true&site=eds-live&db=mdl&AN=26413638
RecordInfo BibRecord:
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    Identifiers:
      – Type: doi
        Value: 10.1166/jnn.2015.10228
    Languages:
      – Code: eng
        Text: English
    PhysicalDescription:
      Pagination:
        StartPage: 2185
    Titles:
      – TitleFull: Annealing Dependence of Solution-Processed Ultra-Thin ZrOx Films for Gate Dielectric Applications.
        Type: main
  BibRelationships:
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      – PersonEntity:
          Name:
            NameFull: Liu GX
      – PersonEntity:
          Name:
            NameFull: Liu A
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            NameFull: Meng Y
      – PersonEntity:
          Name:
            NameFull: Shan FK
      – PersonEntity:
          Name:
            NameFull: Shin BC
      – PersonEntity:
          Name:
            NameFull: Lee WJ
      – PersonEntity:
          Name:
            NameFull: Cho CR
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          Dates:
            – D: 01
              M: 03
              Text: 2015 Mar
              Type: published
              Y: 2015
          Identifiers:
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              Value: 1533-4899
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              Value: 15
            – Type: issue
              Value: 3
          Titles:
            – TitleFull: Journal of nanoscience and nanotechnology
              Type: main
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