Bibliographic Details
| Title: |
Annealing Dependence of Solution-Processed Ultra-Thin ZrOx Films for Gate Dielectric Applications. |
| Authors: |
Liu GX, Liu A, Meng Y, Shan FK, Shin BC, Lee WJ, Cho CR |
| Source: |
Journal of nanoscience and nanotechnology [J Nanosci Nanotechnol] 2015 Mar; Vol. 15 (3), pp. 2185-91. |
| Publication Type: |
Journal Article; Research Support, Non-U.S. Gov't |
| Journal Info: |
Publisher: American Scientific Publishers Country of Publication: United States NLM ID: 101088195 Publication Model: Print Cited Medium: Internet ISSN: 1533-4899 (Electronic) Linking ISSN: 15334880 NLM ISO Abbreviation: J Nanosci Nanotechnol Subsets: PubMed not MEDLINE |
| Database: |
MEDLINE Ultimate |
