Bibliographic Details
| Title: |
Publisher's Note: Enhanced Tunneling Electroresistance in Ferroelectric Tunnel Junctions due to the Reversible Metallization of the Barrier [Phys. Rev. Lett. 116, 197602 (2016)]. |
| Authors: |
Liu X, Burton JD, Tsymbal EY |
| Source: |
Physical review letters [Phys Rev Lett] 2016 May 20; Vol. 116 (20), pp. 209902. Date of Electronic Publication: 2016 May 20. |
| Publication Type: |
Published Erratum |
| Journal Info: |
Publisher: American Physical Society Country of Publication: United States NLM ID: 0401141 Publication Model: Print-Electronic Cited Medium: Internet ISSN: 1079-7114 (Electronic) Linking ISSN: 00319007 NLM ISO Abbreviation: Phys Rev Lett |
| Database: |
MEDLINE Ultimate |
