| Authors: |
Salamin Y; ETH Zurich, Institute of Electromagnetic Fields (IEF), 8092 Zurich, Switzerland., Baeuerle B; ETH Zurich, Institute of Electromagnetic Fields (IEF), 8092 Zurich, Switzerland., Heni W; ETH Zurich, Institute of Electromagnetic Fields (IEF), 8092 Zurich, Switzerland., Abrecht FC; ETH Zurich, Institute of Electromagnetic Fields (IEF), 8092 Zurich, Switzerland., Josten A; ETH Zurich, Institute of Electromagnetic Fields (IEF), 8092 Zurich, Switzerland., Fedoryshyn Y; ETH Zurich, Institute of Electromagnetic Fields (IEF), 8092 Zurich, Switzerland., Haffner C; ETH Zurich, Institute of Electromagnetic Fields (IEF), 8092 Zurich, Switzerland., Bonjour R; ETH Zurich, Institute of Electromagnetic Fields (IEF), 8092 Zurich, Switzerland., Watanabe T; ETH Zurich, Institute of Electromagnetic Fields (IEF), 8092 Zurich, Switzerland., Burla M; ETH Zurich, Institute of Electromagnetic Fields (IEF), 8092 Zurich, Switzerland., Elder DL; University of Washington, Department of Chemistry, Seattle, WA 98195-1700, USA., Dalton LR; University of Washington, Department of Chemistry, Seattle, WA 98195-1700, USA., Leuthold J; ETH Zurich, Institute of Electromagnetic Fields (IEF), 8092 Zurich, Switzerland. |