| Authors: |
Chen Z; Materials Science and Engineering, National University of Singapore, 117575 Singapore.; Centre for Advanced 2D Materials, National University of Singapore, 117546 Singapore., Yang K; Materials Science and Engineering, National University of Singapore, 117575 Singapore.; Centre for Advanced 2D Materials, National University of Singapore, 117546 Singapore., Xian T; Materials Science and Engineering, National University of Singapore, 117575 Singapore., Kocabas C; Department of Materials, University of Manchester, Oxford Road, Manchester M13 9PL, U.K.; National Graphene Institute, University of Manchester, Oxford Road, Manchester M13 9PL, U.K.; Henry Royce Institute for Advanced Materials, University of Manchester, Oxford Road, Manchester M13 9PL, U.K., Morozov SV; Institute of Microelectronics Technology RAS, Chernogolovka 142432, Russia., Castro Neto AH; Materials Science and Engineering, National University of Singapore, 117575 Singapore.; Centre for Advanced 2D Materials, National University of Singapore, 117546 Singapore., Novoselov KS; Materials Science and Engineering, National University of Singapore, 117575 Singapore.; Centre for Advanced 2D Materials, National University of Singapore, 117546 Singapore.; Chongqing 2D Materials Institute, Liangjiang New Area, Chongqing 400714, China., Andreeva DV; Materials Science and Engineering, National University of Singapore, 117575 Singapore.; Centre for Advanced 2D Materials, National University of Singapore, 117546 Singapore., Koperski M; Materials Science and Engineering, National University of Singapore, 117575 Singapore. |
