A High Aspect Ratio Inverse-Designed Holey Metalens.
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| Title: | A High Aspect Ratio Inverse-Designed Holey Metalens. |
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| Authors: | Lim SWD; Harvard John A. Paulson School of Engineering and Applied Sciences, 9 Oxford Street, Cambridge, Massachusetts 02138, United States., Meretska ML; Harvard John A. Paulson School of Engineering and Applied Sciences, 9 Oxford Street, Cambridge, Massachusetts 02138, United States., Capasso F; Harvard John A. Paulson School of Engineering and Applied Sciences, 9 Oxford Street, Cambridge, Massachusetts 02138, United States. |
| Source: | Nano letters [Nano Lett] 2021 Oct 27; Vol. 21 (20), pp. 8642-8649. Date of Electronic Publication: 2021 Oct 11. |
| Publication Type: | Journal Article |
| Journal Info: | Publisher: American Chemical Society Country of Publication: United States NLM ID: 101088070 Publication Model: Print-Electronic Cited Medium: Internet ISSN: 1530-6992 (Electronic) Linking ISSN: 15306984 NLM ISO Abbreviation: Nano Lett Subsets: MEDLINE; PubMed not MEDLINE |
| Database: | MEDLINE Ultimate |
| ISSN: | 1530-6992 |
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| DOI: | 10.1021/acs.nanolett.1c02612 |