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Reliability Characteristics of Metal-Insulator-Semiconductor Capacitors with Low-Dielectric-Constant Materials.

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Title: Reliability Characteristics of Metal-Insulator-Semiconductor Capacitors with Low-Dielectric-Constant Materials.
Authors: Cheng YL; Department of Electrical Engineering, National Chi-Nan University, Nan-Tou 54561, Taiwan., Peng WF; Department of Electrical Engineering, National Chi-Nan University, Nan-Tou 54561, Taiwan., Huang CJ; Department of Electrical Engineering, National Chi-Nan University, Nan-Tou 54561, Taiwan., Chen GS; Department of Materials Science and Engineering, Feng Chia University, Taichung 40724, Taiwan., Fang JS; Department of Materials Science and Engineering, National Formosa University, Huwei 63201, Taiwan.
Source: Molecules (Basel, Switzerland) [Molecules] 2023 Jan 23; Vol. 28 (3). Date of Electronic Publication: 2023 Jan 23.
Publication Type: Journal Article
Journal Info: Publisher: MDPI Country of Publication: Switzerland NLM ID: 100964009 Publication Model: Electronic Cited Medium: Internet ISSN: 1420-3049 (Electronic) Linking ISSN: 14203049 NLM ISO Abbreviation: Molecules Subsets: MEDLINE; PubMed not MEDLINE
Database: MEDLINE Ultimate
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  Data: Reliability Characteristics of Metal-Insulator-Semiconductor Capacitors with Low-Dielectric-Constant Materials.
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  Data: <searchLink fieldCode="AU" term="%22Cheng+YL%22">Cheng YL</searchLink>; Department of Electrical Engineering, National Chi-Nan University, Nan-Tou 54561, Taiwan.<br /><searchLink fieldCode="AU" term="%22Peng+WF%22">Peng WF</searchLink>; Department of Electrical Engineering, National Chi-Nan University, Nan-Tou 54561, Taiwan.<br /><searchLink fieldCode="AU" term="%22Huang+CJ%22">Huang CJ</searchLink>; Department of Electrical Engineering, National Chi-Nan University, Nan-Tou 54561, Taiwan.<br /><searchLink fieldCode="AU" term="%22Chen+GS%22">Chen GS</searchLink>; Department of Materials Science and Engineering, Feng Chia University, Taichung 40724, Taiwan.<br /><searchLink fieldCode="AU" term="%22Fang+JS%22">Fang JS</searchLink>; Department of Materials Science and Engineering, National Formosa University, Huwei 63201, Taiwan.
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  Data: <searchLink fieldCode="JN" term="%22100964009%22">Molecules (Basel, Switzerland)</searchLink> [Molecules] 2023 Jan 23; Vol. 28 (3). <i>Date of Electronic Publication: </i>2023 Jan 23.
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  Data: <i>Publisher: </i><searchLink fieldCode="PB" term="%22MDPI%22">MDPI </searchLink><i>Country of Publication: </i>Switzerland <i>NLM ID: </i>100964009 <i>Publication Model: </i>Electronic <i>Cited Medium: </i>Internet <i>ISSN: </i>1420-3049 (Electronic) <i>Linking ISSN: </i><searchLink fieldCode="IS" term="%2214203049%22">14203049 </searchLink><i>NLM ISO Abbreviation: </i>Molecules <i>Subsets: </i>MEDLINE; PubMed not MEDLINE
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        Value: 10.3390/molecules28031134
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      – Code: eng
        Text: English
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      – TitleFull: Reliability Characteristics of Metal-Insulator-Semiconductor Capacitors with Low-Dielectric-Constant Materials.
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            NameFull: Cheng YL
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            NameFull: Chen GS
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            – D: 23
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              Text: 2023 Jan 23
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              Y: 2023
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