| Authors: |
Twilton J; Department of Chemistry, University of Wisconsin-Madison, Madison, WI, USA., Johnson MR; Department of Chemistry, University of Wisconsin-Madison, Madison, WI, USA., Sidana V; Department of Chemistry, University of Wisconsin-Madison, Madison, WI, USA., Franke MC; Department of Chemistry, University of Wisconsin-Madison, Madison, WI, USA., Bottecchia C; Process Research & Development, Merck & Co., Inc., Rahway, NJ, USA., Lehnherr D; Process Research & Development, Merck & Co., Inc., Rahway, NJ, USA., Lévesque F; Process Research & Development, Merck & Co., Inc., Rahway, NJ, USA., Knapp SMM; Department of Chemistry, University of Wisconsin-Madison, Madison, WI, USA., Wang L; Department of Chemistry, University of Wisconsin-Madison, Madison, WI, USA., Gerken JB; Department of Chemistry, University of Wisconsin-Madison, Madison, WI, USA., Hong CM; Process Research & Development, Merck & Co., Inc., Rahway, NJ, USA., Vickery TP; Process Research & Development, Merck & Co., Inc., Rahway, NJ, USA., Weisel MD; Process Research & Development, Merck & Co., Inc., Rahway, NJ, USA., Strotman NA; Process Research & Development, Merck & Co., Inc., Rahway, NJ, USA., Weix DJ; Department of Chemistry, University of Wisconsin-Madison, Madison, WI, USA. dweix@wisc.edu., Root TW; Department of Chemical and Biological Engineering, University of Wisconsin-Madison, Madison, WI, USA. twroot@wisc.edu., Stahl SS; Department of Chemistry, University of Wisconsin-Madison, Madison, WI, USA. stahl@chem.wisc.edu. |