| Authors: |
Qaderi F; Nanoelectronic devices laboratory (Nanolab), Department of Electrical Engineering, École polytechnique fédérale de Lausanne (EPFL), EPFL STI IEL NANOLAB, ELB 335, Station 11, Lausanne, 1015 Switzerland., Rosca T; Nanoelectronic devices laboratory (Nanolab), Department of Electrical Engineering, École polytechnique fédérale de Lausanne (EPFL), EPFL STI IEL NANOLAB, ELB 335, Station 11, Lausanne, 1015 Switzerland., Burla M; Institute of Electromagnetic Fields (IEF), Eidgenössische Technische Hochschule Zürich (ETHZ), ETZ K 82, Gloriastrasse 35, Zürich, 8092 Switzerland., Leuthold J; Institute of Electromagnetic Fields (IEF), Eidgenössische Technische Hochschule Zürich (ETHZ), ETZ K 82, Gloriastrasse 35, Zürich, 8092 Switzerland., Flandre D; ICTEAM, Ecole Polytechnique de Louvain (UCLouvain), ELEN, Place du Levant 3/L5.03.02, Louvain-la-Neuve, 1348 Belgium., Ionescu AM; Nanoelectronic devices laboratory (Nanolab), Department of Electrical Engineering, École polytechnique fédérale de Lausanne (EPFL), EPFL STI IEL NANOLAB, ELB 335, Station 11, Lausanne, 1015 Switzerland. |