View in EDS

Fatigue behavior of freestanding nickel-molybdenum-tungsten thin films with high-density planar faults.

Saved in:
Bibliographic Details
Title: Fatigue behavior of freestanding nickel-molybdenum-tungsten thin films with high-density planar faults.
Authors: Park J; Department of Mechanical Engineering, Korea Advanced Institute of Science and Technology 291, Daehak-ro, Yuseong-gu, Daejeon 34141, Republic of Korea. gdsim@kaist.ac.kr., Park Y; Department of Mechanical Engineering, Korea Advanced Institute of Science and Technology 291, Daehak-ro, Yuseong-gu, Daejeon 34141, Republic of Korea. gdsim@kaist.ac.kr., Choi S; Department of Mechanical Engineering, Korea Advanced Institute of Science and Technology 291, Daehak-ro, Yuseong-gu, Daejeon 34141, Republic of Korea. gdsim@kaist.ac.kr., Lee ZF; Department of Mechanical Engineering, Korea Advanced Institute of Science and Technology 291, Daehak-ro, Yuseong-gu, Daejeon 34141, Republic of Korea. gdsim@kaist.ac.kr., Sim GD; Department of Mechanical Engineering, Korea Advanced Institute of Science and Technology 291, Daehak-ro, Yuseong-gu, Daejeon 34141, Republic of Korea. gdsim@kaist.ac.kr.
Source: Nanoscale [Nanoscale] 2024 Jun 27; Vol. 16 (25), pp. 12050-12059. Date of Electronic Publication: 2024 Jun 27.
Publication Type: Journal Article
Journal Info: Publisher: RSC Pub Country of Publication: England NLM ID: 101525249 Publication Model: Electronic Cited Medium: Internet ISSN: 2040-3372 (Electronic) Linking ISSN: 20403364 NLM ISO Abbreviation: Nanoscale Subsets: MEDLINE; PubMed not MEDLINE
Database: MEDLINE Ultimate
Description
ISSN:2040-3372
DOI:10.1039/d4nr01033g