Performance Improvement of TiO2 Ultraviolet Photodetectors by Using Atomic Layer Deposited Al2O3 Passivation Layer.

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Title: Performance Improvement of TiO2 Ultraviolet Photodetectors by Using Atomic Layer Deposited Al2O3 Passivation Layer.
Authors: Yang YT; Design and Materials for Medical Equipment and Devices, Da-Yeh University, Changhua 515006, Taiwan., Lin SC; Mechanical and Mechatronics System Research Labs, Industrial Technology Research Institute, Hsinchu 310401, Taiwan., Wang CC; Mechanical and Mechatronics System Research Labs, Industrial Technology Research Institute, Hsinchu 310401, Taiwan., Ho YR; Department of Electrical Engineering, Da-Yeh University, Changhua 515006, Taiwan., Chen JZ; Graduate Institute of Photonics, National Changhua University of Education, Changhua 50007, Taiwan., Huang JJ; Department of Electrical Engineering, Da-Yeh University, Changhua 515006, Taiwan.
Source: Micromachines [Micromachines (Basel)] 2024 Nov 20; Vol. 15 (11). Date of Electronic Publication: 2024 Nov 20.
Publication Type: Journal Article
Journal Info: Publisher: MDPI Country of Publication: Switzerland NLM ID: 101640903 Publication Model: Electronic Cited Medium: Print ISSN: 2072-666X (Print) Linking ISSN: 2072666X NLM ISO Abbreviation: Micromachines (Basel) Subsets: PubMed not MEDLINE
Database: MEDLINE Ultimate
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PubType: Academic Journal
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  Data: Performance Improvement of TiO<subscript>2</subscript> Ultraviolet Photodetectors by Using Atomic Layer Deposited Al<subscript>2</subscript>O<subscript>3</subscript> Passivation Layer.
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  Data: <searchLink fieldCode="AU" term="%22Yang+YT%22">Yang YT</searchLink>; Design and Materials for Medical Equipment and Devices, Da-Yeh University, Changhua 515006, Taiwan.<br /><searchLink fieldCode="AU" term="%22Lin+SC%22">Lin SC</searchLink>; Mechanical and Mechatronics System Research Labs, Industrial Technology Research Institute, Hsinchu 310401, Taiwan.<br /><searchLink fieldCode="AU" term="%22Wang+CC%22">Wang CC</searchLink>; Mechanical and Mechatronics System Research Labs, Industrial Technology Research Institute, Hsinchu 310401, Taiwan.<br /><searchLink fieldCode="AU" term="%22Ho+YR%22">Ho YR</searchLink>; Department of Electrical Engineering, Da-Yeh University, Changhua 515006, Taiwan.<br /><searchLink fieldCode="AU" term="%22Chen+JZ%22">Chen JZ</searchLink>; Graduate Institute of Photonics, National Changhua University of Education, Changhua 50007, Taiwan.<br /><searchLink fieldCode="AU" term="%22Huang+JJ%22">Huang JJ</searchLink>; Department of Electrical Engineering, Da-Yeh University, Changhua 515006, Taiwan.
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  Data: <searchLink fieldCode="JN" term="%22101640903%22">Micromachines</searchLink> [Micromachines (Basel)] 2024 Nov 20; Vol. 15 (11). <i>Date of Electronic Publication: </i>2024 Nov 20.
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  Data: <i>Publisher: </i><searchLink fieldCode="PB" term="%22MDPI%22">MDPI </searchLink><i>Country of Publication: </i>Switzerland <i>NLM ID: </i>101640903 <i>Publication Model: </i>Electronic <i>Cited Medium: </i>Print <i>ISSN: </i>2072-666X (Print) <i>Linking ISSN: </i><searchLink fieldCode="IS" term="%222072666X%22">2072666X </searchLink><i>NLM ISO Abbreviation: </i>Micromachines (Basel) <i>Subsets: </i>PubMed not MEDLINE
PLink https://search.ebscohost.com/login.aspx?direct=true&site=eds-live&db=mdl&AN=39597214
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      – Type: doi
        Value: 10.3390/mi15111402
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      – Code: eng
        Text: English
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      – TitleFull: Performance Improvement of TiO2 Ultraviolet Photodetectors by Using Atomic Layer Deposited Al2O3 Passivation Layer.
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            NameFull: Yang YT
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            NameFull: Lin SC
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              Text: 2024 Nov 20
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