Ultimate Scaling of the Metal-MoS2 Interface Achieving High Performance Nanoscale Schottky Diodes via Conductive Atomic Force Microscopy.
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| Title: | Ultimate Scaling of the Metal-MoS |
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| Authors: | Oh S; Department of Energy Science, Sungkyunkwan University, Suwon, 16419, Republic of Korea., Hong C; Department of Energy Science, Sungkyunkwan University, Suwon, 16419, Republic of Korea., Dat VK; Department of Energy Science, Sungkyunkwan University, Suwon, 16419, Republic of Korea., Kim J; Department of Energy Science, Sungkyunkwan University, Suwon, 16419, Republic of Korea., Heo Y; Department of Physics, Inha University, Incheon, 22212, Republic of Korea., Kim JH; Department of Physics, Pusan National University, Busan, 46241, Republic of Korea. |
| Source: | Small (Weinheim an der Bergstrasse, Germany) [Small] 2025 Aug; Vol. 21 (32), pp. e2411380. Date of Electronic Publication: 2025 Apr 08. |
| Publication Type: | Journal Article |
| Journal Info: | Publisher: Wiley-VCH Country of Publication: Germany NLM ID: 101235338 Publication Model: Print-Electronic Cited Medium: Internet ISSN: 1613-6829 (Electronic) Linking ISSN: 16136810 NLM ISO Abbreviation: Small Subsets: MEDLINE; PubMed not MEDLINE |
| Database: | MEDLINE Ultimate |
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| ISSN: | 1613-6829 |
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| DOI: | 10.1002/smll.202411380 |
