Electron Transport Layer Optimization for All-Inorganic, Vacuum-Deposited Perovskite-Based Photodiodes with Improved Reverse Bias Stability and High Speed.
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| Title: | Electron Transport Layer Optimization for All-Inorganic, Vacuum-Deposited Perovskite-Based Photodiodes with Improved Reverse Bias Stability and High Speed. |
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| Authors: | Papadopoulou A; imec, Kapeldreef 75, Leuven 3001, Belgium.; Department of Electrical Engineering (ESAT), KU Leuven, Kasteelpark Arenberg 10, Leuven 3001, Belgium., Pintor-Monroy MI; imec, Kapeldreef 75, Leuven 3001, Belgium., Dayaran S; Department of Chemistry, Faculty of Sciences, KU Leuven, Leuven 3001, Belgium., Skvortsova I; Electron Microscopy for Materials Research, University of Antwerp, Antwerp 2020, Belgium., de Sousa Gouveia Dos Anjos JP; imec, Kapeldreef 75, Leuven 3001, Belgium.; i3N/CENIMAT, Department of Materials Science, Faculty of Science and Technology, Universidade NOVA de Lisboa and CEMOP/UNINOVA, Campus de Caparica, Caparica 2829-516, Portugal., Subramaniam S; imec, Kapeldreef 75, Leuven 3001, Belgium.; Department of Electrical Engineering (ESAT), KU Leuven, Kasteelpark Arenberg 10, Leuven 3001, Belgium., Song W; imec, Kapeldreef 75, Leuven 3001, Belgium., Lieberman I; imec, Kapeldreef 75, Leuven 3001, Belgium., Kuang Y; imec, Kapeldreef 75, Leuven 3001, Belgium., Hofkens J; Department of Chemistry, Faculty of Sciences, KU Leuven, Leuven 3001, Belgium.; Max Planck Institute for Polymer Research, Mainz 55128, Germany., Roeffaers MBJ; cMAS, Department of Microbial and Molecular Systems, KU Leuven, Celestijnenlaan 200F, Leuven 3001, Belgium., Bals S; Electron Microscopy for Materials Research, University of Antwerp, Antwerp 2020, Belgium., Gehlhaar R; imec, Kapeldreef 75, Leuven 3001, Belgium., Genoe J; imec, Kapeldreef 75, Leuven 3001, Belgium.; Department of Electrical Engineering (ESAT), KU Leuven, Kasteelpark Arenberg 10, Leuven 3001, Belgium. |
| Source: | ACS applied materials & interfaces [ACS Appl Mater Interfaces] 2025 Jul 23; Vol. 17 (29), pp. 42096-42107. Date of Electronic Publication: 2025 Jul 11. |
| Publication Type: | Journal Article |
| Journal Info: | Publisher: American Chemical Society Country of Publication: United States NLM ID: 101504991 Publication Model: Print-Electronic Cited Medium: Internet ISSN: 1944-8252 (Electronic) Linking ISSN: 19448244 NLM ISO Abbreviation: ACS Appl Mater Interfaces Subsets: MEDLINE; PubMed not MEDLINE |
| Database: | MEDLINE Ultimate |
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