Stability of electron ptychography at low electron dose.
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| Title: | Stability of electron ptychography at low electron dose. |
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| Authors: | Dearg M; School of Physics, Engineering and Technology, University of York, York, UK., Michaelides N; School of Physics, Engineering and Technology, University of York, York, UK., Gilbert J; School of Physics, Engineering and Technology, University of York, York, UK., Ding Z; Department of Materials, University of Oxford, Oxford, UK., Aslam Z; Leeds Electron Microscopy And Spectroscopy Centre (LEMAS), The Bragg Centre for Materials Research, Faculty of Engineering and Physical Sciences, University of Leeds, Leeds, UK., Hopkinson DG; Electron Physical Science Imaging Centre, Diamond Light Source Ltd., Harwell Science and Innovation Campus, Didcot, Oxfordshire, UK., Allen CS; Department of Materials, University of Oxford, Oxford, UK.; Electron Physical Science Imaging Centre, Diamond Light Source Ltd., Harwell Science and Innovation Campus, Didcot, Oxfordshire, UK., Clark L; School of Physics, Engineering and Technology, University of York, York, UK. |
| Source: | Journal of microscopy [J Microsc] 2025 Nov; Vol. 300 (2), pp. 217-226. Date of Electronic Publication: 2025 Jul 26. |
| Publication Type: | Journal Article |
| Journal Info: | Publisher: Published for the Royal Microscopical Society by Blackwell Scientific Publications Country of Publication: England NLM ID: 0204522 Publication Model: Print-Electronic Cited Medium: Internet ISSN: 1365-2818 (Electronic) Linking ISSN: 00222720 NLM ISO Abbreviation: J Microsc Subsets: MEDLINE; PubMed not MEDLINE |
| Database: | MEDLINE Ultimate |
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| ISSN: | 1365-2818 |
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| DOI: | 10.1111/jmi.70011 |
