Adhesion of Self-Complementary, Sinusoidal Surfaces Fabricated Using Two-Photon Polymerization.
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| Title: | Adhesion of Self-Complementary, Sinusoidal Surfaces Fabricated Using Two-Photon Polymerization. |
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| Authors: | Jeske MP; Department of Chemical Engineering, University of Rochester, 4306 Wegmans Hall, Rochester, New York 14627, United States.; Laboratory for Laser Energetics, University of Rochester, 250 East River Road, Rochester, New York 14623, United States., Wang H; Department of Mechanical Engineering, University of Rochester, 235 Hopeman Bldg., Rochester, New York 14627, United States., Askari H; Department of Mechanical Engineering, University of Rochester, 235 Hopeman Bldg., Rochester, New York 14627, United States., Harding DR; Department of Chemical Engineering, University of Rochester, 4306 Wegmans Hall, Rochester, New York 14627, United States.; Laboratory for Laser Energetics, University of Rochester, 250 East River Road, Rochester, New York 14623, United States., Anthamatten M; Department of Chemical Engineering, University of Rochester, 4306 Wegmans Hall, Rochester, New York 14627, United States.; Laboratory for Laser Energetics, University of Rochester, 250 East River Road, Rochester, New York 14623, United States. |
| Source: | ACS applied polymer materials [ACS Appl Polym Mater] 2025 Sep 25; Vol. 7 (19), pp. 13276-13285. Date of Electronic Publication: 2025 Sep 25 (Print Publication: 2025). |
| Publication Type: | Journal Article |
| Journal Info: | Publisher: American Chemical Society Country of Publication: United States NLM ID: 101734999 Publication Model: eCollection Cited Medium: Internet ISSN: 2637-6105 (Electronic) Linking ISSN: 26376105 NLM ISO Abbreviation: ACS Appl Polym Mater Subsets: PubMed not MEDLINE |
| Database: | MEDLINE Ultimate |
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