Potential-Controlled Deposition of Multilayer CO2 Reduction Catalyst Films onto Silicon Photoelectrodes Demonstrates Thickness-Dependent Catalytic Rates.
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| Title: | Potential-Controlled Deposition of Multilayer CO |
|---|---|
| Authors: | Teitsworth TS; Department of Chemistry, University of North Carolina at Chapel Hill, Chapel Hill, North Carolina 27599-3290, United States.; Department of Chemistry, Vassar College, Poughkeepsie, New York 12604, United States., Rotundo L; Chemistry Division, Brookhaven National Laboratory, Upton, New York 11973-5000, United States., Fang H; Department of Chemistry, University of Pennsylvania, Philadelphia, Pennsylvania 19104, United States., Tanwar M; Department of Chemistry, University of Pennsylvania, Philadelphia, Pennsylvania 19104, United States., Robinson T; Department of Chemistry, University of North Carolina at Chapel Hill, Chapel Hill, North Carolina 27599-3290, United States., Siegel DJ; Department of Chemistry, University of North Carolina at Chapel Hill, Chapel Hill, North Carolina 27599-3290, United States., Powers RE; Department of Chemistry, University of North Carolina at Chapel Hill, Chapel Hill, North Carolina 27599-3290, United States., Orr AD; Department of Chemistry, University of North Carolina at Chapel Hill, Chapel Hill, North Carolina 27599-3290, United States., Harvey AK; Department of Chemistry, University of North Carolina at Chapel Hill, Chapel Hill, North Carolina 27599-3290, United States., Sampaio RN; Department of Chemistry, University of North Carolina at Chapel Hill, Chapel Hill, North Carolina 27599-3290, United States., Donley CL; Department of Chemistry, University of North Carolina at Chapel Hill, Chapel Hill, North Carolina 27599-3290, United States., Atkin JM; Department of Chemistry, University of North Carolina at Chapel Hill, Chapel Hill, North Carolina 27599-3290, United States., Dempsey JL; Department of Chemistry, University of North Carolina at Chapel Hill, Chapel Hill, North Carolina 27599-3290, United States., Fakhraai Z; Department of Chemistry, University of Pennsylvania, Philadelphia, Pennsylvania 19104, United States., Manbeck GF; Chemistry Division, Brookhaven National Laboratory, Upton, New York 11973-5000, United States., Tereniak SJ; Department of Chemistry, University of North Carolina at Chapel Hill, Chapel Hill, North Carolina 27599-3290, United States., Lockett MR; Department of Chemistry, University of North Carolina at Chapel Hill, Chapel Hill, North Carolina 27599-3290, United States. |
| Source: | ACS applied materials & interfaces [ACS Appl Mater Interfaces] 2025 Nov 12; Vol. 17 (45), pp. 62044-62052. Date of Electronic Publication: 2025 Nov 03. |
| Publication Type: | Journal Article |
| Journal Info: | Publisher: American Chemical Society Country of Publication: United States NLM ID: 101504991 Publication Model: Print-Electronic Cited Medium: Internet ISSN: 1944-8252 (Electronic) Linking ISSN: 19448244 NLM ISO Abbreviation: ACS Appl Mater Interfaces Subsets: MEDLINE; PubMed not MEDLINE |
| Database: | MEDLINE Ultimate |
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