View in EDS

Dehydrogenation vs Apparent Hydrogenation: Unraveling the Mechanisms of He and O2 Plasma Etching on Colloidal Nanocrystal Films.

Saved in:
Bibliographic Details
Title: Dehydrogenation vs Apparent Hydrogenation: Unraveling the Mechanisms of He and O2 Plasma Etching on Colloidal Nanocrystal Films.
Authors: Shaw S; Department of Materials Science & Engineering, Iowa State University of Science and Technology, Ames, Iowa 50011, United States., Silva T; Instituto de Física, Universidade de São Paulo, São Paulo 05508-090, Brazil., Bobbitt JM; Department of Chemistry, Iowa State University of Science and Technology, Ames, Iowa 50011, United States.; Ames Laboratory, United States Department of Energy, Ames, Iowa 50011, United States., Naab F; Michigan Ion Beam Laboratory, University of Michigan, Ann Arbor, Michigan 48109, United States., Rodrigues CL; Instituto de Física, Universidade de São Paulo, São Paulo 05508-090, Brazil., Smith EA; Department of Chemistry, Iowa State University of Science and Technology, Ames, Iowa 50011, United States.; Ames Laboratory, United States Department of Energy, Ames, Iowa 50011, United States., Cademartiri L; Department of Chemistry, Life Sciences and Environmental Sustainability, University of Parma, 43012 Parma, Italy.
Source: ACS applied materials & interfaces [ACS Appl Mater Interfaces] 2025 Nov 19; Vol. 17 (46), pp. 63707-63714. Date of Electronic Publication: 2025 Nov 10.
Publication Type: Journal Article
Journal Info: Publisher: American Chemical Society Country of Publication: United States NLM ID: 101504991 Publication Model: Print-Electronic Cited Medium: Internet ISSN: 1944-8252 (Electronic) Linking ISSN: 19448244 NLM ISO Abbreviation: ACS Appl Mater Interfaces Subsets: MEDLINE; PubMed not MEDLINE
Database: MEDLINE Ultimate
Description
ISSN:1944-8252
DOI:10.1021/acsami.5c14331