Dehydrogenation vs Apparent Hydrogenation: Unraveling the Mechanisms of He and O2 Plasma Etching on Colloidal Nanocrystal Films.
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| Title: | Dehydrogenation vs Apparent Hydrogenation: Unraveling the Mechanisms of He and O |
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| Authors: | Shaw S; Department of Materials Science & Engineering, Iowa State University of Science and Technology, Ames, Iowa 50011, United States., Silva T; Instituto de Física, Universidade de São Paulo, São Paulo 05508-090, Brazil., Bobbitt JM; Department of Chemistry, Iowa State University of Science and Technology, Ames, Iowa 50011, United States.; Ames Laboratory, United States Department of Energy, Ames, Iowa 50011, United States., Naab F; Michigan Ion Beam Laboratory, University of Michigan, Ann Arbor, Michigan 48109, United States., Rodrigues CL; Instituto de Física, Universidade de São Paulo, São Paulo 05508-090, Brazil., Smith EA; Department of Chemistry, Iowa State University of Science and Technology, Ames, Iowa 50011, United States.; Ames Laboratory, United States Department of Energy, Ames, Iowa 50011, United States., Cademartiri L; Department of Chemistry, Life Sciences and Environmental Sustainability, University of Parma, 43012 Parma, Italy. |
| Source: | ACS applied materials & interfaces [ACS Appl Mater Interfaces] 2025 Nov 19; Vol. 17 (46), pp. 63707-63714. Date of Electronic Publication: 2025 Nov 10. |
| Publication Type: | Journal Article |
| Journal Info: | Publisher: American Chemical Society Country of Publication: United States NLM ID: 101504991 Publication Model: Print-Electronic Cited Medium: Internet ISSN: 1944-8252 (Electronic) Linking ISSN: 19448244 NLM ISO Abbreviation: ACS Appl Mater Interfaces Subsets: MEDLINE; PubMed not MEDLINE |
| Database: | MEDLINE Ultimate |
| FullText | Text: Availability: 0 |
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| Header | DbId: mdl DbLabel: MEDLINE Ultimate An: 41212636 AccessLevel: 2 PubType: Academic Journal PubTypeId: academicJournal PreciseRelevancyScore: 0 |
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| Items | – Name: Title Label: Title Group: Ti Data: Dehydrogenation vs Apparent Hydrogenation: Unraveling the Mechanisms of He and O<subscript>2</subscript> Plasma Etching on Colloidal Nanocrystal Films. – Name: Author Label: Authors Group: Au Data: <searchLink fieldCode="AU" term="%22Shaw+S%22">Shaw S</searchLink>; Department of Materials Science & Engineering, Iowa State University of Science and Technology, Ames, Iowa 50011, United States.<br /><searchLink fieldCode="AU" term="%22Silva+T%22">Silva T</searchLink>; Instituto de Física, Universidade de São Paulo, São Paulo 05508-090, Brazil.<br /><searchLink fieldCode="AU" term="%22Bobbitt+JM%22">Bobbitt JM</searchLink>; Department of Chemistry, Iowa State University of Science and Technology, Ames, Iowa 50011, United States.; Ames Laboratory, United States Department of Energy, Ames, Iowa 50011, United States.<br /><searchLink fieldCode="AU" term="%22Naab+F%22">Naab F</searchLink>; Michigan Ion Beam Laboratory, University of Michigan, Ann Arbor, Michigan 48109, United States.<br /><searchLink fieldCode="AU" term="%22Rodrigues+CL%22">Rodrigues CL</searchLink>; Instituto de Física, Universidade de São Paulo, São Paulo 05508-090, Brazil.<br /><searchLink fieldCode="AU" term="%22Smith+EA%22">Smith EA</searchLink>; Department of Chemistry, Iowa State University of Science and Technology, Ames, Iowa 50011, United States.; Ames Laboratory, United States Department of Energy, Ames, Iowa 50011, United States.<br /><searchLink fieldCode="AU" term="%22Cademartiri+L%22">Cademartiri L</searchLink>; Department of Chemistry, Life Sciences and Environmental Sustainability, University of Parma, 43012 Parma, Italy. – Name: TitleSource Label: Source Group: Src Data: <searchLink fieldCode="JN" term="%22101504991%22">ACS applied materials & interfaces</searchLink> [ACS Appl Mater Interfaces] 2025 Nov 19; Vol. 17 (46), pp. 63707-63714. <i>Date of Electronic Publication: </i>2025 Nov 10. – Name: TypePub Label: Publication Type Group: TypPub Data: Journal Article – Name: TitleSource Label: Journal Info Group: Src Data: <i>Publisher: </i><searchLink fieldCode="PB" term="%22American+Chemical+Society%22">American Chemical Society </searchLink><i>Country of Publication: </i>United States <i>NLM ID: </i>101504991 <i>Publication Model: </i>Print-Electronic <i>Cited Medium: </i>Internet <i>ISSN: </i>1944-8252 (Electronic) <i>Linking ISSN: </i><searchLink fieldCode="IS" term="%2219448244%22">19448244 </searchLink><i>NLM ISO Abbreviation: </i>ACS Appl Mater Interfaces <i>Subsets: </i>MEDLINE; PubMed not MEDLINE |
| PLink | https://search.ebscohost.com/login.aspx?direct=true&site=eds-live&db=mdl&AN=41212636 |
| RecordInfo | BibRecord: BibEntity: Identifiers: – Type: doi Value: 10.1021/acsami.5c14331 Languages: – Code: eng Text: English PhysicalDescription: Pagination: StartPage: 63707 Titles: – TitleFull: Dehydrogenation vs Apparent Hydrogenation: Unraveling the Mechanisms of He and O2 Plasma Etching on Colloidal Nanocrystal Films. Type: main BibRelationships: HasContributorRelationships: – PersonEntity: Name: NameFull: Shaw S – PersonEntity: Name: NameFull: Silva T – PersonEntity: Name: NameFull: Bobbitt JM – PersonEntity: Name: NameFull: Naab F – PersonEntity: Name: NameFull: Rodrigues CL – PersonEntity: Name: NameFull: Smith EA – PersonEntity: Name: NameFull: Cademartiri L IsPartOfRelationships: – BibEntity: Dates: – D: 19 M: 11 Text: 2025 Nov 19 Type: published Y: 2025 Identifiers: – Type: issn-electronic Value: 1944-8252 Numbering: – Type: volume Value: 17 – Type: issue Value: 46 Titles: – TitleFull: ACS applied materials & interfaces Type: main |
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